Technology

Fraunhofer Institute for Integrated Systems and Device Technology

In the department technology the new semiconductor technological materials, devices, processes, and methods for producing CMOS (CLSI, ULSI), nanoelectronics, and power electronics are developed. Therefore, complete process lines for silicon and silicon carbide are available. In particular, the activities and competences include, inter alia, surface and thin-film technology for new materials, processes for thin dielectric and metallic layers, ion implantation, circuit modifications and IC repair, nanostructuring, particle electronics, metrology and analytics as well as the development of passive devices.


Contact

  • Dr. Anton Bauer

    Head of Department

    Fraunhofer Institute for Integrated Systems and Device Technology IISB

    Schottkystrasse 10
    91058 ErlangenGermany

    • Phone +49 9131 761 - 308
    • Fax +49 9131 761 - 360