Fraunhofer Institute for Integrated Systems and Device Technology
The group runs different implanters for various applications. An energy range of a few keV up to the MeV region is covered. The spectrum of implanted elements is continuously expanded. The main focus lies on the implantation into semiconductors.
Growing attention is brought to the implantation into non-semiconductors (metals, polymers, biomaterials) for which specially developed implanters with large volume target chambers are available at the Institute.
Concerning process control, the software tool ENCOTION which simulates mass spectra and mass interferences was developed. Among other things, this tool is used for the development of contamination free implantation processes.