Fraunhofer Institute for Integrated Systems and Device Technology

Low Temperature Thin-Film Technologies

Sensitive substrates like technical glasses or plastics for display or lighting applications demand for low temperature deposition techniques. Aiming at system integration Fraunhofer IISB offers deposition services as well as R&D know-how for the improvement of thin-films and devices.

The team has long-term expertise in process and equipment development for physical (PVD) and chemical vapor deposition (CVD), the latter ranging from conventional low-pressure CVD through metal organic CVD to plasma-enhanced or atomic-layer deposition techniques. Recent projects include sputtering of metal oxides for use in thin-film transistors.