Annual Conference 2011 - Fraunhofer Institute for Integrated Systems and Device Technology IISB

Annual Conference 2011

Fraunhofer Institute for Integrated Systems and Device Technology

December 9, 2011, Technology Simulation Department

Flyer [ PDF 0.15867996215820312 MB ]

Presentations available for download

Welcome, J. Lorenz, Fraunhofer IISB [ PDF 0.927393913269043 MB ]
Challenges for Predictive EUV Simulation, P. Evanschitzky, Fraunhofer IISB [ PDF 9.631420135498047 MB ]
Photomask Metrology: Challenges and Solutions, T. Scherübl, Carl Zeiss SMS GmbH [ PDF 1.3430919647216797 MB ]
Proximity Lithography Simulation for next Generation Flat Panel Displays, N. Ünal, GenISys GmbH [ PDF 3.5393943786621094 MB ]
Advanced Lithography Simulation: A Case Study Using Dr.LiTHO, T. Fühner, Fraunhofer IISB [ PDF 5.724552154541016 MB ]
Topography Simulation for Lithography Masks, O. Rudolph, Fraunhofer IISB [ PDF 2.598114013671875 MB ]
Process Variations - from Topography to Circuits, E. Bär, Fraunhofer IISB [ PDF 0.8464736938476562 MB ]
Variation Impact on Circuits and Systems, R. Jancke, Fraunhofer IIS/EAS [ PDF 2.157154083251953 MB ]
Variability in High Performance Analog Semiconductor Manufacturing, R. Minixhofer, austriamicrosystems [ PDF 0.9170904159545898 MB ]
Simulation for Power Electronics, S. Koffel, Fraunhofer IISB [ PDF 1.2718639373779297 MB ]
Model Development for Low Power Electronics, M. Hackenberg, Fraunhofer IISB [ PDF 1.4267501831054688 MB ]
Device Simulation for Future Technologies, A. Burenkov, Fraunhofer IISB [ PDF 1.5461177825927734 MB ]
Anniversaries: TCAD and Prof. H. Ryssel, 35 Years of Technology and Simulation, J. Lorenz, Fraunhofer IISB [ PDF 2.80013370513916 MB ]

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