Konferenz  /  25. Februar 2024  -  29. Februar 2024

SPIE Advanced Lithography + Patterning 2024

The Event for Emerging Technology in the Semiconductor Industry

Join other leading researchers who are solving challenges in optical and EUV lithography, patterning technologies, metrology, and process integration for semiconductor manufacturing and adjacent applications. Your colleagues look forward to seeing you in San Jose.

The conference includes:

  • Plenary talks
  • Technical presentations
  • Networking sessions
  • Course offerings
  • Exhibition
  • Special events
     

The following presentations report on research results from Fraunhofer IISB:

Exploring the Limits of High Contrast Contact Imaging Using Split Pupil Exposures in High-NA EUV Lithography (invited paper)
by A. Erdmann et al., 26 February, 1:20 PM - 1:40 PM PST | Convention Center, Grand Ballroom 220A

3D Mask Simulation and Lithographic Imaging using Physics-informed Neural Networks
by V. Medvedev et al., 28 February, 2:00 PM - 2:20 PM PST | Convention Center, Grand Ballroom 220A
 

All-Symposium Panel: The Future of EUV

In this technical special event, Dr. Andreas Erdmann will be one of the panelists.
28 February, 4:00 PM - 5:30 PM PST | Convention Center, Room 210A
 

Conference Homepage

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