Workshop  /  September 26, 2019  -  September 28, 2019

17th Fraunhofer IISB Lithography Simulation Workshop

September 26-28, 2019, Behringersmühle, Germany

The workshop brings together experts from various fields of lithography simulation. It provides an excellent opportunity to exchange ideas and discuss results and developments in:

- Computational EUV lithography: 3D mask, high NA and stochastic effects, resolution enhancement techniques, novel resist materials and phenomena

- Computational metrology and imaging for lithography: Deep learning and related techniques, mask characterization, hybrid optical models, SEM modeling, big data and novel methods for process characterization

- Modeling challenges and solutions for lithography applications beyond CMOS: 3D lithography and gray tone techniques for micro- and nanooptics, Si-photonics, bio-sensing, MEMS, ...