Workshop / September 26, 2019 - September 28, 2019
17th Fraunhofer IISB Lithography Simulation Workshop
September 26-28, 2019, Behringersmühle, Germany
The workshop brings together experts from various fields of lithography simulation. It provides an excellent opportunity to exchange ideas and discuss results and developments in:
- Computational EUV lithography: 3D mask, high NA and stochastic effects, resolution enhancement techniques, novel resist materials and phenomena
- Computational metrology and imaging for lithography: Deep learning and related techniques, mask characterization, hybrid optical models, SEM modeling, big data and novel methods for process characterization
- Modeling challenges and solutions for lithography applications beyond CMOS: 3D lithography and gray tone techniques for micro- and nanooptics, Si-photonics, bio-sensing, MEMS, ...