May 25, 2023 - May 27, 2023
The 18th Fraunhofer IISB lithography simulation workshop will bring together experts from various fields of lithography simulation and related areas including computational optics, photochemistry, semiconductor processing /metrology and applied artificial intelligence.
The workshop will host about 40 attendees from academics and industry. The invited talks will present reviews on recent developments and applications of computational lithography, description of novel methods to address lithography-related problems and discuss selected unresolved problems.
In addition to presentations by international experts in semiconductor lithography, the workshop provides excellent opportunities for invited PhD students to present their research work and to exchange ideas and discuss results and developments in advanced lithography. An archive with the program flyers of previous workshops can be found here.
The workshop will take place in Behringersmühle from May 25-27, 2023. The location in the heart of Franconian Switzerland about 50 km north of Nuremberg is ideal for networking. The workshop will focus on the following topics:
Updates will be provided via our mailing list. If you would like to subscribe to the list, please send an e-mail to Andreas Erdmann.
Registration: The event is fully booked.