We develop UV-nanoimprint lithography (UV-NIL) solutions for micro- and nanooptical applications (e.g., integrated optical waveguides, components, sensors or plasmonic filters) and provide the whole process chain from master fabrication to pattern transfer into targeted materials. This includes research and development of nanoimprint processes, evaluation of resist materials and the fabrication of prototype devices. Nanoimprint processes can be combined with our 200 mm Si CMOS line. Besides our nanoimprint activities we are working on the fabrication of functionalized and bioactivated patterned PDMS layers for biomedical applications.
In the field of focused ion beam (FIB) processing, our research focuses on the fabrication of customized nano- and microstructures which is based on an in-depth understanding of all relevant effects related to FIB patterning. Again, FIB patterning as a mix & match solution for pre-patterned or pre-functionalized devices or circuits is also covered.
Our third research competence is in the development and application of electrical scanning probe microscopy (SPM) modes. This includes the correlation of SPM based measurement results with data from established conventional measurement methods as well as the introduction of such SPM modes in new application fields.
Last but not least we apply our long-term experience in electrical contamination analysis (e.g., carrier lifetime measurements) for the development of optimized process control or material characterization strategies: Both, for silicon and silicon carbide based technologies.
We are ready to be your partner for research and development in the above described areas. Both applied and fundamental research is our competence due to our long-term experience in the field.