Fraunhofer Institute for Integrated Systems and Device Technology IISBWorkshop / June 06, 2024 - June 08, 2024
19th Fraunhofer IISB Lithography Simulation Workshop
ics file with date
Fraunhofer IISB Lithography Simulation Workshop 2024
Event details
Location
Behringersmühle, Germany
Date
June 06, 2024 - June 08, 2024
Diffraction cone of mask aligner simulated with Dr.LiTHO
Near field inside opening between EUV mask absorbers simulated with Dr.LiTHO
Andreas Erdmann (4th from the right) and the Fraunhofer IISB Computational Lithography and Optics Team at the IISB Lithography Simulation Workshop 2023
The 19th Fraunhofer IISB lithography simulation workshop will bring together experts from various fields of lithography simulation and related areas including computational optics, photochemistry, semiconductor processing /metrology and applied artificial intelligence.
The workshop will host about 40 attendees from academics and industry. The invited talks will present reviews on recent developments and applications of computational lithography, description of novel methods to address lithography-related problems and discuss selected unresolved problems.
In addition to presentations by international experts in semiconductor lithography, the workshop provides excellent opportunities for invited PhD students to present their research work and to exchange ideas and discuss results and developments in advanced lithography. An archive with the program flyers of previous workshops can be found here.
The workshop will take place in Behringersmühle from June 6-8, 2024. The location in the heart of Franconian Switzerland about 50 km north of Nuremberg is ideal for networking.
The workshop will focus on the following topics:
- Challenges and perspectives of high NA EUV lithography: optical resolution enhancements to push the limits of high NA, 3D mask effects and mitigation strategies, novel photoresist materials and processes
- Deep learning / AI in lithography: deep learning for inverse imaging problems, optimization and process control, physics informed neural networks, digital twins
- Lithography for fabrication of optical metasurfaces and other photonic components: two-photon lithography, nanoimprint, manufacturing aware design of optical metasurfaces, grayscale lithography, Si-photonics
Updates will be provided via our mailing list. If you would like to subscribe to the list, please send an e-mail to Andreas Erdmann.