25th Workshop of the GMM User Group "Deposition and Etch Processing"

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With a delicious wafer-shaped cake and great community spirit we celebrated the 25th workhop of the GMM user group "Deposition and Etch Processing" on Colleagues from the international semiconductor community gathered at the Fraunhofer IISB in Erlangen to discuss current developments in the field of wide-bandgap semiconductor technology and to network. The focus was on new unit processes for deposition and etch.

On this festive occasion, Dr. Werner Robl (Infineon Technologies) and Dr. Georg Roeder (Fraunhofer IISB) were honored with uniquely processed jubilee wafers for their dedicaction to keep the GMM user group running since it's first meeting in 1999. Going forward, Dr. Mirko Vogt, Manager Chemical Vapor Deposition at Infineon and Dr. Susanne Oertel, head of the Front End department at Fraunhofer IISB, will take over the organizational activities for the "Deposition and Etch Processing" GMM user group. 

If you are interested in joining the user group, you are very welcome!

© Elisabeth Iglhaut / Fraunhofer IISB
The participants of the 25th GMM user group meeting "Deposition and Etch Processing" on 06.12.23 at Fraunhofer IISB.
© Elisabeth Iglhaut / Fraunhofer IISB
From left to right: Dr. Georg Roeder and Dr. Susanne Oertel (both Fraunhofer IISB) with Dr. Mirko Vogt and Dr. Werner Robl (both Infineon Technologies). Roeder and Robl were honored for their many years of commitment to the GMM user group "Deposits and Etch Processing".
© Elisabeth Iglhaut / Fraunhofer IISB
Dr. Werner Robl (Infineon Technologies) has been actively involved in organizing the user group meetings since 1999.

The goal of the annual workshop is to create an open forum for discussions on the process areas of physical vapor deposition (PVD), plasma-enhanced chemical vapor deposition (PECVD), electrochemical deposition (ECD), general deposition processes and plasma etching and to facilitate an exchange of experience between manufacturers of semiconductor components, equipment manufacturers and research institutes. To this end, current topics from the process areas covered by the user group will be presented at the workshop.

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