Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISBFraunhofer IISB Lithography Simulation Workshop 2027
Veranstaltungsdetails
Veranstaltungsort
Behringersmühle
Datum
03. Juni 2027 - 05. Juni 2027
The Fraunhofer IISB Computational Lithography and Optics Team, together with several former team members, at the IISB Lithography Simulation Workshop 2026.
Our 22nd Fraunhofer IISB Lithography Simulation Workshop will bring together experts from various fields of lithography simulation and related areas, including computational optics, photochemistry, semiconductor processing and metrology, and applied artificial intelligence.
The workshop will host approximately 50 - 60 participants from academia and industry. Invited talks will cover recent developments and applications in computational lithography, novel methods for addressing lithography-related challenges, and selected unresolved problems.
In addition to presentations by international experts in semiconductor lithography, the workshop will provide excellent opportunities for PhD students to present their research work, exchange ideas, and discuss results and developments in advanced lithography.
The workshop will take place in Behringersmühle from June 3 to 5, 2027. The location, in the heart of Franconian Switzerland, about 50 km north of Nuremberg, is ideal for networking.
The focus areas of the workshop will be announced shortly. Registration for the workshop is expected to begin in March 2027.
Updates on the workshop will be provided via our mailing list. If you would like to subscribe, please send an e-mail to Christian Schwemmer.
Archive containing the program flyers from previous workshops