Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISBFraunhofer IISB Lithography Simulation Workshop 2026
Veranstaltungsdetails
Veranstaltungsort
Behringersmühle
Datum
28. Mai 2026 - 30. Mai 2026
Diffraction cone of mask aligner simulated with Dr.LiTHO
Near field inside opening between EUV mask absorbers simulated with Dr.LiTHO
Andreas Erdmann (standing in the middle, holding the wafer) and the Fraunhofer IISB Computational Lithography and Optics Team at the IISB Lithography Simulation Workshop 2025
Our 21st Fraunhofer IISB lithography simulation workshop will bring together experts from various fields of lithography simulation and related areas including computational optics, photochemistry, semiconductor processing /metrology and applied artificial intelligence.
The workshop will host about 50 attendees from academics and industry. The invited talks will present reviews on recent developments and applications of computational lithography, description of novel methods to address lithography-related problems and discuss selected unresolved problems.
In addition to presentations by international experts in semiconductor lithography, the workshop provides excellent opportunities for invited PhD students to present their research work and to exchange ideas and discuss results and developments in advanced lithography. An archive with the program flyers of previous workshops can be found here.
The workshop will take place in Behringersmühle from May 28 to 30, 2026. The location in the heart of Franconian Switzerland about 50 km north of Nuremberg is ideal for networking.
The focus areas of the workshop will be announced shortly.
Updates on the workshop will be provided via our mailing list. If you would like to subscribe to the list, please send an e-mail to Andreas Erdmann.
Registration for the workshop is expected to start in March 2026.