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  • Würzburg, Germany / 09/16/2018 - 09/21/2018

    22nd International Conference on Ion Implantation Technology (IIT 2018)

    The International Conference on Ion Implantation Technology (IIT) is an open forum for discussion of major challenges in current and emerging technologies related to the tools and processes for ion implantation, annealing of semiconductors, and non-semiconductors, implanted devices, metrology of implanted layers and devices, as well as methods related to ion implantation. The IIT 2018 will be held on September 16-21, 2018, in Würzburg, Germany.

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  • The International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) provides an international forum for the presentation of leading-edge research and development results in the area of process and device simulation. The 23rd SISPAD will be held from September 24-26, 2018 in Austin, Texas, USA.

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