SPIE Advanced Lithography + Patterning 2026

The Event for Emerging Technology in the Semiconductor Industry

Join other leading researchers who are solving challenges in optical and EUV lithography, patterning technologies, metrology, and process integration for semiconductor manufacturing and adjacent applications.

The conference includes:

• Plenary talks
• Technical presentations
• Networking sessions
• Course offerings
• Exhibition
   

The following presentation reports on research results from Fraunhofer IISB:

Benefits of Mask3D Effects in High-NA and Hyper-NA EUV Lithography 
by A. Erdmann et al.
23 February 2026, 10:40 AM - 11:00 AM PST (oral presentation) | Convention Center, Grand Ballroom 220A

We are looking forward to seeing you in San Jose!