41. Treffen der Nutzergruppe Heißprozesse und RTP

Begrüßung
Anton Bauer, Fraunhofer IISB, Erlangen
Wilfried Lerch, centrotherm photovoltaics, Blaubeuren

Flash Lamp Annealing of Transparent Conducting Oxides on Ultra-thin Glass
Jasper Westphalen, Fraunhofer FEP, Dresden

Enabling Processing Strategies for Advanced Semiconductor Manufacturing
Wilhelm Kegel, centrotherm photovoltaics, Blaubeuren

Low-temperature Microwave-based Plasma Oxidation of Ge and Oxidation of Silicon Followed by Plasma Nitridation
Wilfried Lerch, centrotherm photovoltaics, Blaubeuren

IEDM2016: "SiGe HBT with f_T / f_max of 505 GHz / 720 GHz"
Thomas Lenke, IHP, Frankfurt (Oder)