Publications Computational Lithography and Optics

Jahr
Year
Titel/Autor:in
Title/Author
Publikationstyp
Publication Type
2021 Modeling the impact of shrinkage effects on photoresist development
D'Silva, S.; Mülders, T.; Stock, H.-J.; Erdmann, A.
Zeitschriftenaufsatz
Journal Article
2021 Accurate prediction of EUV lithographic images and 3D mask effects using generative networks
Awad, A.; Brendel, P.; Evanschitzky, P.; Woldeamanual, D.S.; Rosskopf, A.; Erdmann, A.
Zeitschriftenaufsatz
Journal Article
2021 Study of novel EUVL mask absorber candidates
Wu, M.; Thakare, D.; Marneffe, J.-F. de; Jaenen, P.; Souriau, L.; Opsomer, K.; Soulié, J.-P.; Erdmann, A.; Mesilhy, H.; Naujok, P.; Foltin, M.; Soltwisch, V.; Saadeh, Q.; Philipsen, V.
Zeitschriftenaufsatz
Journal Article
2021 Investigation of waveguide modes in EUV mask absorbers
Mesilhy, H.; Evanschitzky, P.; Bottiglieri, G.; Lare, C. Van; Setten, E. Van; Erdmann, A.
Zeitschriftenaufsatz
Journal Article
2021 Stochastic simulation and calibration of organometallic photoresists for extreme ultraviolet lithography
Belete, Z.; Bisschop, P. de; Welling, U.; Erdmann, A.
Zeitschriftenaufsatz
Journal Article
2021 Simulation of polychromatic effects in high NA EUV lithography
Erdmann, A.; Mesilhy, H.; Evanschitzky, P.; Saadeh, Q.; Soltwisch, V.; Bihr, S.; Zimmermann, J.; Philipsen, V.
Konferenzbeitrag
Conference Paper
2021 Mask defect detection with hybrid deep learning network
Evanschitzky, P.; Auth, N.; Heil, T.; Hermanns, C.F.; Erdmann, A.
Zeitschriftenaufsatz
Journal Article
2021 Simulation study on EUV multilayer polarization effects
Bilalaj, L.; Mesilhy, H.; Erdmann, A.
Konferenzbeitrag
Conference Paper
2020 Mask absorber for next generation EUV lithography
Wu, M.; Thakare, D.; Marneffe, J.-F. de; Jaenen, P.; Souriau, L.; Opsomer, K.; Soulié, J.-P.; Erdmann, A.; Mesilhy, H.; Naujok, P.; Foltin, M.; Soltwisch, V.; Saadeh, Q.; Philipsen, V.
Konferenzbeitrag
Conference Paper
2020 Perspectives and tradeoffs of absorber materials for high NA EUV lithography
Erdmann, A.; Mesilhy, H.; Evanschitzky, P.; Philipsen, V.; Timmermans, F.; Bauer, M.
Zeitschriftenaufsatz
Journal Article
2020 Pathfinding the perfect EUV mask: The role of the multilayer
Mesilhy, H.; Evanschitzky, P.; Bottiglieri, G.; Setten, E. van; Fliervoet, T.; Erdmann, A.
Konferenzbeitrag
Conference Paper
2019 3D mask effects in high NA EUV imaging
Erdmann, A.; Evanschitzky, P.; Bottiglieri, G.; Setten, E. van; Fliervoet, T.
Konferenzbeitrag
Conference Paper
2019 Mask absorber development to enable next-generation EUVL
Philipsen, V.; Luong, K.V.; Opsomer, K.; Souriau, L.; Rip, J.; Detavernier, C.; Erdmann, A.; Evanschitzky, P.; Laubis, C.; Honicke, P.; Soltwisch, V.; Hendrickx, E.
Konferenzbeitrag
Conference Paper
2019 Lithographic effects due to particles on high-NA EUV mask pellicle
Devaraj, L.; Bottiglieri, G.; Erdmann, A.; Wählisch, F.; Kupers, M.; Setten, E. van; Fliervoet, T.
Konferenzbeitrag
Conference Paper
2019 Learned sensing: Jointly optimized microscope hardware for accurate image classification
Muthumbi, A.; Chaware, A.; Kim, K.; Zhou, K.C.; Konda, P.C.; Chen, R.; Judkewitz, B.; Erdmann, A.; Kappes, B.; Horstmeyer, R.
Zeitschriftenaufsatz
Journal Article
2019 Attenuated phase shift mask for extreme ultraviolet: Can they mitigate three-dimensional mask effects?
Erdmann, A.; Evanschitzky, P.; Mesilhy, H.; Philipsen, V.; Hendrickx, E.; Bauer, M.
Zeitschriftenaufsatz
Journal Article
2018 Accurate determination of 3D PSF and resist effects in grayscale laser lithography
Onanuga, T.; Kaspar, C.; Sailer, H.; Erdmann, A.
Konferenzbeitrag
Conference Paper
2018 Fourier ptychography for lithography high NA systems
Dejkameh, A.; Erdmann, A.; Evanschitzky, P.; Ekinci, Y.
Konferenzbeitrag
Conference Paper
2018 Simulation study of illumination effects in high-NA EUV lithography
Ismail, M.; Evanschitzky, P.; Erdmann, A.; Bottiglieri, G.; Setten, E. van; Fliervoet, T.F.
Konferenzbeitrag
Conference Paper
2018 Novel EUV mask absorber evaluation in support of next-generation EUV imaging
Philipsen, V.; Luong, K.V.; Opsomer, K.; Detavernier, C.; Hendrickx, E.; Erdmann, A.; Evanschitzky, P.; Kruijs, R.W.E. van de; Heidarnia-Fathabad, Z.; Scholze, F.; Laubis, C.
Konferenzbeitrag
Conference Paper
2018 Modeling of block copolymer dry etching for directed self-assembly lithography
Belete, Zelalem; Bär, Eberhard; Erdmann, Andreas
Konferenzbeitrag
Conference Paper
2018 Application of deep learning algorithms for Lithographic mask characterization
Woldeamanual, D.S.; Erdmann, A.; Maier, A.
Konferenzbeitrag
Conference Paper
2018 Attenuated PSM for EUV
Erdmann, A.; Evanschitzky, P.; Mesilhy, H.; Philipsen, V.; Hendrickx, E.; Bauer, M.
Konferenzbeitrag
Conference Paper
2017 Characterization and mitigation of 3D mask effects in extreme ultraviolet lithography
Erdmann, A.; Xu, D.; Evanschitzky, P.; Philipsen, V.; Luong, V.; Hendrickx, E.
Zeitschriftenaufsatz
Journal Article
2017 Simulation flow and model verification for laser direct-write lithography
Onanuga, T.; Rumler, M.; Erdmann, A.
Zeitschriftenaufsatz
Journal Article
2017 Reducing EUV mask 3D effects by alternative metal absorbers
Philipsen, V.; Luong, K.V.; Souriau, L.; Hendrickx, E.; Erdmann, A.; Xu, D.; Evanschitzky, P.; Kruijs, R.W.E. van de; Edrisi, A.; Scholze, F.; Laubis, C.; Irmscher, M.; Naasz, S.; Reuter, C.
Konferenzbeitrag
Conference Paper
2017 Special issue on ptychography
Erdmann, A.; Situ, G.
Zeitschriftenaufsatz
Journal Article
2017 A physical model for innovative laser direct write lithography
Onanuga, T.; Rumler, M.; Erdmann, A.
Konferenzbeitrag
Conference Paper
2017 Efficient simulation of EUV pellicles
Evanschitzky, P.; Erdmann, A.
Konferenzbeitrag
Conference Paper
2017 Levet-set-based inverse lithography under random field shape uncertainty in a vector Hopkins imaging model
Wu, X.; Fühner, T.; Erdmann, A.; Lam, E.Y.
Konferenzbeitrag
Conference Paper
2017 Reducing extreme ultraviolet mask three-dimensional effects by alternative metal absorbers
Philipsen, V.; Luong, K.V.; Souriau, L.; Erdmann, A.; Xu, D.; Evanschitzky, P.; Kruijs, R.W.E. van de; Edrisi, A.; Scholze, F.; Laubis, C.; Irmscher, M.; Naasz, S.; Reuter, C.; Hendrickx, E.
Zeitschriftenaufsatz
Journal Article
2016 Incorporating photomask shape uncertainty in computational lithography
Wu, X.; Liu, S.; Erdmann, A.; Lam, E.Y.
Konferenzbeitrag
Conference Paper
2016 Challenges for predictive EUV mask modeling
Evanschitzky, Peter; Erdmann, Andreas
Vortrag
Presentation
2016 Resolution enhancements for semiconductor lithography: A computational perspective
Erdmann, A.
Konferenzbeitrag
Conference Paper
2016 Extreme ultraviolet multilayer defect analysis and geometry reconstruction
Xu, D.; Evanschitzky, P.; Erdmann, A.
Zeitschriftenaufsatz
Journal Article
2016 Automated source/mask/directed self-assembly optimization using a self-adaptive hierarchical modeling approach
Fühner, T.; Michalak, P.; Wu, X.; Erdmann, A.
Konferenzbeitrag
Conference Paper
2016 3D simulation of light exposure and resist effects in laser direct write lithography
Onanuga, Temitope; Erdmann, Andreas
Konferenzbeitrag
Conference Paper
2016 Extending VLSI and alternative technology with optical and complementary lithography
Lai, K.; Erdmann, A.
Editorial
2016 Mask-induced best-focus shifts in deep ultraviolet and extreme ultraviolet lithography
Erdmann, A.; Evanschitzky, P.; Neumann, J.T.; Gräupner, P.
Zeitschriftenaufsatz
Journal Article
2016 Efficient simulation of EUV pellicles
Evanschitzky, Peter; Erdmann, Andreas
Vortrag
Presentation
2015 Mask-induced best-focus-shifts in DUV and EUV lithography
Erdmann, A.; Evanschitzky, P.; Neumann, J.T.; Gräupner, P.
Konferenzbeitrag
Conference Paper
2015 Application of the transport of intensity equation to EUV multilayer defect analysis
Xu, D.; Evanschitzky, P.; Erdmann, A.
Konferenzbeitrag
Conference Paper
2015 Optical and EUV projection lithography: A computational view
Erdmann, A.; Fühner, T.; Evanschitzky, P.; Agudelo, V.; Freund, C.; Michalak, P.; Xu, D.B.
Zeitschriftenaufsatz
Journal Article
2015 Application of principal component analysis to EUV multilayer defect printing
Xu, D.; Evanschitzky, P.; Erdmann, A.
Konferenzbeitrag
Conference Paper
2015 Continuation of scaling with optical and complementary lithography. Editorial
Lai, K.F.; Erdmann, A.
Editorial
2015 Introduction to the special issue on optical lithography
Erdmann, A.; Shibuya, M.
Zeitschriftenaufsatz
Journal Article
2014 Pixel-based defect detection from high-NA optical projection images
Xu, D.B.; Fühner, T.; Erdmann, A.
Zeitschriftenaufsatz
Journal Article
2014 Advances in lithography: Introduction to the feature. Editorial
Erdmann, A.; Liang, R.G.; Sezginer, A.; Smith, B.
Editorial
2014 Challenges and opportunities for process modeling in the nanotechnology era
Lorenz, J.K.; Baer, E.; Burenkov, A.; Erdmann, A.; Evanschitzky, P.; Pichler, P.
Zeitschriftenaufsatz
Journal Article
2014 Lithographic process window optimization for mask aligner proximity lithography
Voelkel, R.; Vogler, U.; Bramati, A.; Erdmann, A.; Ünal, N.; Hofmann, U.; Hennemeyer, M.; Zoberbier, R.; Nguyen, D.; Brugger, J.
Konferenzbeitrag
Conference Paper
2014 In situ aberration measurement method using a phase-shift ring mask
Wang, X.; Li, S.; Yang, J.; Tang, F.; Yan, G.; Erdmann, A.
Konferenzbeitrag
Conference Paper
2014 Advances in lithography: Introduction to the feature. Editorial
Erdmann, A.; Liang, R.G.; Sezginer, A.; Smith, B.
Editorial
2014 Aberration measurement technique based on an analytical linear model of a through-focus aerial image
Yan, G.; Wang, X.; Li, S.; Yang, J.; Xu, D.; Erdmann, A.
Zeitschriftenaufsatz
Journal Article
2014 Fast model for mask spectrum simulation and analysis of mask shadowing effects in extreme ultraviolet lithography
Liu, Xiaolei; Wang, Xiangzhao; Li, Sikun; Yan, Guanyong; Erdmann, A.
Zeitschriftenaufsatz
Journal Article
2014 Application of artificial neural networks to compact mask models in optical lithography simulation
Agudelo, V.; Fühner, T.; Erdmann, A.; Evanschitzky, P.
Zeitschriftenaufsatz
Journal Article
2014 Rigorous simulation and optimization of the lithography/directed self-assembly co-process
Fühner, T.; Welling, U.; Müller, M.; Erdmann, A.
Konferenzbeitrag
Conference Paper
2014 A defocus measurement method for an in situ aberration measurement method using a phase-shift ring mask
Li, S.; Wang, X.; Yang, J.; Tang, F.; Yan, G.; Erdmann, A.
Konferenzbeitrag
Conference Paper
2014 Fast rigorous model for mask spectrum simulation and analysis of mask shadowing effects in EUV lithography
Liu, X.; Wang, X.; Li, S.; Yan, G.; Erdmann, A.
Konferenzbeitrag
Conference Paper
2013 In situ aberration measurement technique based on an aerial image with an optimized source
Yan, G.; Wang, X.; Li, S.; Yang, J.; Xu, D.; Duan, L.; Bourov, A.Y.; Erdmann, A.
Zeitschriftenaufsatz
Journal Article
2013 Defect inspection and detection using optical image projection
Xu, D.; Li, S.; Wang, X.; Erdmann, A.
Vortrag
Presentation
2013 Modeling studies on alternative EUV mask concepts for higher NA
Erdmann, A.; Fühner, T.; Evanschitzky, P.; Neumann, J.T.; Ruoff, J.; Gräupner, P.
Konferenzbeitrag
Conference Paper
2013 Efficient simulation of extreme ultraviolet multilayer defects with rigorous data base approach
Evanschitzky, Peter; Shao, Feng; Erdmann, Andreas
Zeitschriftenaufsatz
Journal Article
2013 Application of artificial neural networks to compact mask models in optical lithography simulation
Agudelo, V.; Fühner, T.; Erdmann, A.; Evanschitzky, P.
Konferenzbeitrag
Conference Paper
2013 Adaptive denoising method to improve aberration measurement performance
Yang, J.; Wang, X.; Li, S.; Duan, L.; Bourov, A.Y.; Erdmann, A.
Zeitschriftenaufsatz
Journal Article
2013 Modeling strategies for EUV mask multilayer defect dispositioning and repair
Erdmann, A.; Evanschitzky, P.; Bret, T.; Jonckheere, R.
Konferenzbeitrag
Conference Paper
2013 Defect parameters retrieval based on optical projection images
Xu, D.; Li, S.; Wang, X.; Fühner, T.; Erdmann, A.
Konferenzbeitrag
Conference Paper
2013 Source mask optimization using real-coded genetic algorithms
Yang, C.; Wang, X.; Li, S.; Erdmann, A.
Konferenzbeitrag
Conference Paper
2013 High-order aberration measurement technique based on quadratic Zernike model with optimized source
Yang, J.; Wang, X.; Li, S.; Duan, L.; Yan, G.; Xu, D.; Bourov, A.Y.; Erdmann, A.
Zeitschriftenaufsatz
Journal Article
2012 Mask aligner lithography simulation - From lithography simulation to process validation
Motzek, K.; Partel, S.; Bramati, A.; Hofmann, U.; Unal, N.; Hennemeyer, M.; Hornung, M.; Heindl, A.; Ruhland, M.; Erdmann, A.; Hudek, P.
Zeitschriftenaufsatz
Journal Article
2012 Simulation of 3D inclined/rotated UV lithography and its application to microneedles
Liu, S.; Roeder, G.; Aygun, G.; Motzek, K.; Evanschitzky, P.; Erdmann, A.
Zeitschriftenaufsatz
Journal Article
2012 In situ aberration measurement technique based on quadratic Zernike model
Yang, J.; Wang, X.; Li, S.; Duan, L.; Yan, G.; Xu, D.; Bourov, A.Y.; Erdmann, A.
Konferenzbeitrag
Conference Paper
2012 Advanced mask aligner lithography (AMALITH)
Völkel, R.; Vogler, U.; Bramati, A.; Weichelt, T.; Stürzebecher, L.; Zeitner, U.D.; Motzek, K.; Erdmann, A.; Hornung, M.; Zoberbier, R.
Konferenzbeitrag
Conference Paper
2012 Resist properties required for 6.67 nm extreme ultraviolet lithography
Kozawa, T.; Erdmann, A.
Zeitschriftenaufsatz
Journal Article
2012 In-situ aberration measurement technique based on aerial image with optimized source
Yan, G.; Wang, X.; Li, S.; Yang, J.; Xu, D.; Duan, L.; Bourov, A.Y.; Erdmann, A.
Konferenzbeitrag
Conference Paper
2012 Rigorous electromagnetic field simulation of the impact of photomask line-edge and line-width roughness on lithographic processes
Rudolph, O.; Evanschitzky, P.; Erdmann, A.; Bär, E.; Lorenz, J.
Zeitschriftenaufsatz
Journal Article
2012 Imaging characteristics of binary and phase shift masks for EUV projection lithography
Erdmann, A.; Evanschitzky, P.
Konferenzbeitrag
Conference Paper
2012 Evaluation of various compact mask and imaging models for the efficient simulation of mask topography effects in immersion lithography
Agudelo, V.; Evanschitzky, P.; Erdmann, A.; Fühner, T.
Konferenzbeitrag
Conference Paper
2012 Analysis of EUV mask multilayer defect printing characteristics
Erdmann, A.; Evanschitzky, P.; Bret, T.; Jonckheerec, R.
Konferenzbeitrag
Conference Paper
2012 Efficient simulation of EUV multilayer defects with rigorous data base approach
Evanschitzky, Peter; Shao, Feng; Erdmann, Andreas
Konferenzbeitrag
Conference Paper
2012 Influence of two typical defects on the near-field optical properties of multilayer dielectric compression gratings
Jin, Y.X.; Guan, H.Y.; Kong, F.Y.; Wang, J.P.; Erdmann, A.; Liu, S.J.; Du, Y.; Shao, J.D.; He, H.B.; Yi, K.
Zeitschriftenaufsatz
Journal Article
2012 Mutual source, mask and projector pupil optimization
Fühner, T.; Evanschitzky, P.; Erdmann, A.
Konferenzbeitrag
Conference Paper
2012 Resonant metamaterials for contrast enhancement in optical lithography
Dobmann, S.; Shyroki, D.; Banzer, P.; Erdmann, A.; Peschel, U.
Zeitschriftenaufsatz
Journal Article
2011 Predictive modeling of EUV-lithography: The role of mask, optics, and photoresist effects
Erdmann, A.; Evanschitzky, P.; Shao, F.; Fühner, T.; Lorusso, G.; Hendrickx, E.; Goethals, A.M.; Jonckheere, R.; Bret, T.; Hofmann, T.
Konferenzbeitrag
Conference Paper
2011 Numerical optimization of illumination and mask layout for the enlargement of process windows and for the control of photoresist profiles in proximity printing
Motzek, Kristian; Partel, Stefan; Vogler, Uwe; Erdmann, Andreas
Konferenzbeitrag
Conference Paper
2011 Computational algorithms for optimizing mask layouts in proximity printing
Motzek, K.; Vogler, U.; Hennemeyer, M.; Hornung, M.; Voelkel, R.; Erdmann, A.; Meliorisz, B.
Zeitschriftenaufsatz
Journal Article
2011 Modeling of mask diffraction and projection imaging for advanced optical and EUV lithography
Erdmann, A.; Shao, F.; Agudelo, V.; Fühner, T.; Evanschitzky, P.
Zeitschriftenaufsatz
Journal Article
2011 Influence of geometry variations and defects on the near-field optical properties of pulsed compression gratings
Wang, J.; Erdmann, A.; Liu, S.; Shao, J.; Jin, Y.; He, H.; Yi, K.
Konferenzbeitrag
Conference Paper
2011 Rigorous EMF simulation of the impact of photomask line-edge and line-width roughness on lithographic processes
Rudolph, O.H.; Evanschitzky, P.; Erdmann, A.; Bär, E.; Lorenz, J.
Konferenzbeitrag
Conference Paper
2011 Innovations in structured thin film design and fabrication for optical applications
Qi, H.; Wang, J.; Erdmann, A.; Jin, Y.; Shao, J.; Fan, Z.
Konferenzbeitrag
Conference Paper
2011 Compensation of mask induced aberrations by projector wavefront control
Evanschitzky, Peter; Shao, Feng; Fühner, Tim; Erdmann, Andreas
Konferenzbeitrag
Conference Paper
2011 Determination of the dill parameters of thick positive resist for use in modeling applications
Roeder, G.; Liu, S.; Aygun, G.; Evanschitzky, P.; Erdmann, A.; Schellenberger, M.; Pfitzner, L.
Konferenzbeitrag
Conference Paper
2011 Accuracy and performance of 3D mask models in optical projection lithography
Agudelo, V.; Evanschitzky, P.; Erdmann, A.; Fühner, T.; Shao, F.; Limmer, S.; Fey, D.
Konferenzbeitrag
Conference Paper
2011 Image simulation of projection systems in photolithography
Evanschitzky, Peter; Fühner, Tim; Erdmann, Andreas
Konferenzbeitrag
Conference Paper
2011 Feasibility study of chemically amplified resists for short wavelength extreme ultraviolet lithography
Kozawa, T.; Erdmann, A.
Zeitschriftenaufsatz
Journal Article
2011 Modellierung und Simulation bei Mask Aligner Lithographie (Source-Mask Optimization)
Vogler, U.; Bramati, A.; Völkel, R.; Hornung, M.; Zoberbier, R.; Motzek, M.; Erdmann, A.; Stürzebecher, L.; Zeitner, U.
Zeitschriftenaufsatz
Journal Article
2011 Rigorous EMF simulation of the impact of photomask line-edge and line-width roughness on lithographic processes
Rudolph, Oliver; Evanschitzky, Peter; Erdmann, Andreas; Bär, Eberhard; Lorenz, Jürgen
Poster
2011 Analytical model for EUV mask diffraction field calculation
Cao, Y.; Wang, X.; Erdmann, A.; Bu, P.; Bu, Y.
Konferenzbeitrag
Conference Paper
2010 Extraordinary low transmission of a metamaterial for application in lithography
Dobmann, S.; Ploss, D.; Reibold, D.; Erdmann, A.; Peschel, U.
Konferenzbeitrag
Conference Paper
2010 Acid diffusion effects between resists in freezing processes used for contact hole patterning
Fuhrmann, J.; Fiebach, A.; Erdmann, A.; Trefonas, P.
Konferenzbeitrag
Conference Paper
2010 Efficient simulation of three-dimensional EUV masks for rigorous source mask optimization and mask induced imaging artifact analysis
Evanschitzky, P.; Fühner, T.; Shao, F.; Erdmann, A.
Konferenzbeitrag
Conference Paper
Diese Liste ist ein Auszug aus der Publikationsplattform Fraunhofer-Publica

This list has been generated from the publication platform Fraunhofer-Publica
Jahr
Year
Titel/Autor:in
Title/Author
Publikationstyp
Publication Type
2010 Optimization of illumination pupils and mask structures for proximity printing
Motzek, K.; Bich, A.; Erdmann, A.; Hornung, M.; Hennemeyer, M.; Meliorisz, B.; Hofmann, U.; Ünal, N.; Völkel, R.; Partel, S.; Hudek, P.
Konferenzbeitrag
Conference Paper
2010 Rigorous EMF simulation of absorber shape variations and their impact on lithographic processes
Rahimi, Z.; Erdmann, A.; Evanschitzky, P.; Pflaum, C.
Konferenzbeitrag
Conference Paper
2010 Topography-aware BARC optimization for double patterning
Liu, S.; Fühner, T.; Shao, F.; Barenbaum, A.; Jahn, J.; Erdmann, A.
Konferenzbeitrag
Conference Paper
2010 Modeling of double patterning interactions in litho-cure-litho-etch (LCLE) processes
Erdmann, A.; Shao, F.; Fuhrmann, J.; Fiebach, A.; Patsis, G.P.; Trefonas, P.
Konferenzbeitrag
Conference Paper
2010 Characterization of the scattering effect of complex mask geometries with surface roughness
Rahimi, Z.; Erdmann, A.; Pflaum, C.
Konferenzbeitrag
Conference Paper
2010 Modeling of exploration of reversible contrast enhacement layers for double exposure lithography
Shao, F.; Cooper, G.D.; Chen, Z.; Erdmann, A.
Konferenzbeitrag
Conference Paper
2010 Mask diffraction analysis and optimization for extreme ultraviolet masks
Erdmann, A.; Evanschitzky, P.; Fühner, T.
Zeitschriftenaufsatz
Journal Article
2010 Fast and highly accurate simulation of the printing behavior of EUV multilayer defects based on different models
Shao, F.; Evanschitzky, P.; Motzek, K.; Erdmann, A.
Konferenzbeitrag
Conference Paper
2010 Mask and wafer topography effects in optical and EUV-lithography
Erdmann, A.; Shao, F.; Evanschitzky, P.; Fühner, T.
Konferenzbeitrag
Conference Paper
2010 Mask-topography-induced phase effects and wave aberrations in optical and extreme ultraviolet lithography
Erdmann, A.; Shao, F.; Evanschitzky, P.; Fühner, T.
Konferenzbeitrag
Conference Paper
2009 Extraordinary low transmission effects for ultra-thin patterned metal films
Reibold, D.; Shao, F.; Erdmann, A.; Peschel, U.
Zeitschriftenaufsatz
Journal Article
2009 Rigorous diffraction simulations of topographic wafer stacks in double patterning
Feng, S.; Evanschitzky, P.; Fühner, T.; Erdmann, A.
Konferenzbeitrag
Conference Paper
2009 A model of self-limiting residual acid diffusion for pattern doubling
Fuhrmann, J.; Fiebach, A.; Uhle, M.; Erdmann, A.; Szmanda, C.R.; Truong, C.
Konferenzbeitrag
Conference Paper
2009 Lithography simulation: Modeling techniques and selected applications
Erdmann, A.; Fühner, T.; Shao, F.; Evanschitzky, P.
Konferenzbeitrag
Conference Paper
2009 Lithographic importance of base diffusion in chemically amplified photoresists
Schnattinger, T.; Erdmann, A.
Konferenzbeitrag
Conference Paper
2009 Mask diffraction analysis and optimization for EUV masks
Erdmann, A.; Evanschitzky, P.; Fühner, T.
Konferenzbeitrag
Conference Paper
2009 Efficient simulation and optimization of wafer topographies in double patterning
Shao, F.; Evanschitzky, P.; Fühner, T.; Erdmann, A.
Konferenzbeitrag
Conference Paper
2009 Efficient analysis of three dimensional EUV mask imaging artifacts using the waveguide decomposition method
Shao, F.; Evanschitzky, P.; Fühner, T.; Erdmann, A.
Konferenzbeitrag
Conference Paper
2009 Extended Abbe approach for fast and accurate lithography imaging simulations
Evanschitzky, P.; Erdmann, A.; Fühner, T.
Konferenzbeitrag
Conference Paper
2009 Advanced lithography models for strict process control in the 32 nm technology node
Patsis, G.P.; Drygiannakis, D.; Raptis, I.; Gogolides, E.; Erdmann, A.
Konferenzbeitrag
Conference Paper
2009 Photomasks for semiconductor lithography: From simple shadow casters to complex 3D scattering objects
Erdmann, A.; Reibold, D.; Fühner, T.; Evanschitzky, P.
Konferenzbeitrag
Conference Paper
2009 Finite Integration (FI) method for modelling optical waves in lithography masks
Rahimi, Z.; Erdmann, A.; Pflaum, C.
Konferenzbeitrag
Conference Paper
2009 Exploration of linear and non-linear double exposure techniques by simulation
Petersen, J.S.; Greenway, R.T.; Fühner, T.; Evanschitzky, P.; Shao, F.; Erdmann, A.
Konferenzbeitrag
Conference Paper
2008 A comprehensive resist model for the prediction of line-edge roughness material and process dependencies in optical lithography
Schnattinger, T.; Erdmann, A.
Konferenzbeitrag
Conference Paper
2008 Investigation of high-resolution contact printing
Meliorisz, B.; Partel, S.; Schnattinger, T.; Fühner, T.; Erdmann, A.; Hudek, P.
Konferenzbeitrag
Conference Paper
2008 A simulation study on the impact of lithographic process variations on CMOS device performance
Fühner, T.; Kampen, C.; Kodrasi, I.; Burenkov, A.; Erdmann, A.
Konferenzbeitrag
Conference Paper
2008 On the stability of fully depleted SOI MOSFETs under lithography process variations
Kampen, C.; Fühner, T.; Burenkov, A.; Erdmann, A.; Lorenz, J.; Ryssel, H.
Konferenzbeitrag
Conference Paper
2008 Photomasks for semiconductor lithography: From simple shadow casters to complex 3D scattering objects
Erdmann, A.; Reibold, D.; Fühner, T.; Evanschitzky, P.
Konferenzbeitrag
Conference Paper
2008 Optimization of mask absorber stacks and illumination settings for contact hole imaging
Erdmann, A.; Fühner, T.; Evanschitzky, P.
Konferenzbeitrag
Conference Paper
2008 Fast rigorous simulation of mask diffraction using the waveguide method with parallelized decomposition technique
Shao, F.; Evanschitzky, P.; Reibold, D.; Erdmann, A.
Konferenzbeitrag
Conference Paper
2008 Simulation-based EUV source and mask optimization
Fühner, T.; Erdmann, A.; Evanschitzky, P.
Konferenzbeitrag
Conference Paper
2008 Rigorous electromagnetic field simulation of two-beam interference exposures for the exploration of double patterning and double exposure scenarios
Erdmann, A.; Evanschitzky, P.; Fühner, T.; Schnattinger, T.; Xu, C.B.; Szmanda, C.
Konferenzbeitrag
Conference Paper
2008 Increasing the predictability of AIMSTM measurements by coupling to resist simulations
Meliorisz, B.; Erdmann, A.; Schnattinger, T.; Strößner, U.; Scherübl, T.; Bisschop, P. de; Philipsen, V.
Konferenzbeitrag
Conference Paper
2008 Benchmark of rigorous methods for electromagnetic field simulations
Burger, S.; Zschiedrich, L.; Schmidt, F.; Evanschitzky, P.; Erdmann, A.
Konferenzbeitrag
Conference Paper
2007 Rigorous electromagnetic field mask modeling and related lithographic effects in the low k(1) and ultrahigh numerical aperture regime
Erdmann, A.; Evanschitzky, P.
Zeitschriftenaufsatz
Journal Article
2007 Fast near field simulation of optical and EUV masks using the waveguide method
Evanschitzky, P.; Erdmann, A.
Konferenzbeitrag
Conference Paper
2007 Simulation of mask proximity printing
Meliorisz, B.; Erdmann, A.
Zeitschriftenaufsatz
Journal Article
2007 Dr.LiTHO - a development and research lithography simulator
Fühner, T.; Schnattinger, T.; Ardelean, G.; Erdmann, A.
Konferenzbeitrag
Conference Paper
2007 Memetic algorithms: Parametric optimization for microlithography
Dürr, C.; Fühner, T.; Tollkühn, B.; Erdmann, A.; Kokai, G.
Aufsatz in Buch
Book Article
2007 Direct optimization approach for lithographic process conditions
Fühner, T.; Erdmann, A.; Seifert, S.
Zeitschriftenaufsatz
Journal Article
2007 Impact of alternative mask stacks on the imaging performance at NA 1.20 and above
Philipsen, V.; Mesuda, K.; Bisschop, P. de; Erdmann, A.; Citarella, G.; Evanschitzky, P.; Birkner, R.; Richter, R.; Scherübl, T.
Konferenzbeitrag
Conference Paper
2007 Simulation of proximity and contact lithography
Meliorisz, B.; Evanschitzky, P.; Erdmann, A.
Zeitschriftenaufsatz
Journal Article
2007 The impact of the mask stack and its optical parameters on the imaging performance
Erdmann, A.; Fühner, T.; Seifert, S.; Popp, S.; Evanschitzky, P.
Konferenzbeitrag
Conference Paper
2007 Simulation of larger mask areas using the waveguide method with fast decomposition technique
Evanschitzky, P.; Shao, F.; Erdmann, A.; Reibold, D.
Konferenzbeitrag
Conference Paper
2006 Efficient optimization of lithographic process conditions using a distributed, combined global/local search approach
Fühner, T.; Popp, S.; Dürr, C.; Erdmann, A.
Konferenzbeitrag
Conference Paper
2006 Accurate extraction of maximum current densities from the layout
Seidl, A.; Schnattinger, T.; Erdmann, A.; Hartmann, H.; Petrashenko, A.
Konferenzbeitrag
Conference Paper
2006 Three-dimensional resist development simulation with discrete models
Schnattinger, T.; Baer, E.; Erdmann, A.
Zeitschriftenaufsatz
Journal Article
2006 Benchmark of a lithography simulation tool for next generation applications
Tollkühn, B.; Uhle, M.; Fuhrmann, J.; Gärtner, K.; Heubner, A.; Erdmann, A.
Konferenzbeitrag
Conference Paper
2006 Rigorous mask modelling beyond the hopkins approach
Schermer, J.; Evanschitzky, P.; Erdmann, A.
Konferenzbeitrag
Conference Paper
2006 Rigorous mask modeling beyond the Hopkins approach
Schermer, J.; Evanschitzky, P.; Erdmann, A.
Konferenzbeitrag
Conference Paper
2006 A fast development simulation algorithm for discrete resist models
Schnattinger, T.; Bär, E.; Erdmann, A.
Konferenzbeitrag
Conference Paper
2006 Defect printability study using EUV lithography
Holfeld, C.; Bubke, K.; Lehmann, F.; La Fontaine, B.; Pawloski, A.R.; Schwarzl, S.; Kamm, F.M.; Graf, T.; Erdmann, A.
Konferenzbeitrag
Conference Paper
2006 Mask defect printing mechanisms for future lithography generations
Erdmann, A.; Graf, T.; Bubke, K.; Höllein, I.; Teuber, S.
Konferenzbeitrag
Conference Paper
2006 Mesoscopic resist processing simulation in optical lithography
Schnattinger, T.; Bär, E.; Erdmann, A.
Konferenzbeitrag
Conference Paper
2006 Rigorous mask modeling using waveguide and FDTD methods. An assessment for typical hyper NA imaging problems
Erdmann, A.; Evanschitzky, P.; Citarella, G.; Fühner, T.; Bisschop, P. de
Konferenzbeitrag
Conference Paper
2006 Validity of the Hopkins approximation in simulations of hyper-NA (NA>1) line-space structures for an attenuated PSM mask
Erdmann, A.; Citarella, G.; Evanschitzky, P.; Schermer, H.; Philipsen, V.; Bisschop, P. de
Konferenzbeitrag
Conference Paper
2005 Mask and wafer topography effects in immersion lithography
Erdmann, A.; Evanschitzky, P.; Bisschop, P. de
Konferenzbeitrag
Conference Paper
2005 Improved mask and source representations for automatic optimization of lithographic process conditions using a genetic algorithm
Fühner, T.; Erdmann, A.
Konferenzbeitrag
Conference Paper
2005 Mask modeling in the low k(1) and ultrahigh NA regime: Phase and polarization effects
Erdmann, A.
Konferenzbeitrag
Conference Paper
2005 Simulation of the effect of a resist-surface bound air bubble on imaging in immersion lithography
Bisschop, P. de; Erdmann, A.; Rathsfeld, A.
Konferenzbeitrag
Conference Paper
2005 Mask modeling in the low k1 and ultrahigh NA regime: phase and polarization effects
Erdmann, A.
Konferenzbeitrag
Conference Paper
2005 Three dimensional EUV simulations: a new mask near field and imaging simulation system
Evanschitzky, P.; Erdmann, A.
Konferenzbeitrag
Conference Paper
2005 Correlation analysis: A fast and reliable method for a better understanding of simulation models in optical lithography
Tollkühn, B.; Heubner, A.; Elian, K.; Ruppenstein, B.; Erdmann, A.
Konferenzbeitrag
Conference Paper
2005 Aerial image analysis for defective masks in optical lithography
Graf, T.; Erdmann, A.; Evanschitzky, P.; Tollkühn, B.; Eggers, K.; Ziebold, R.; Teuber, S.; Höllein, I.
Konferenzbeitrag
Conference Paper
2005 Simplified resist models for efficient simulation of contact holes and line ends
Tollkühn, B.; Erdmann, A.; Semmler, A.; Nölscher, C.
Konferenzbeitrag
Conference Paper
2005 Modeling and simulation
Erdmann, A.
Aufsatz in Buch
Book Article
2004 Genetic algorithm for optimization and calibration in process simulation
Fühner, T.; Erdmann, A.; Ortiz, C.J.; Lorenz, J.
Konferenzbeitrag
Conference Paper
2004 Verfahren zur Bestimmung von Strukturparametern einer Oberflaeche
Weidner, A.; Erdmann, A.; Schneider, C.
Patent
2004 Towards automatic mask and source optimization for optical lithography
Erdmann, A.; Fühner, T.; Schnattinger, T.; Tollkühn, B.
Konferenzbeitrag
Conference Paper
2004 Do we need complex resist models for predictive simulation of lithographic process performance?
Tollkühn, B.; Erdmann, A.; Lammers, J.; Nolscher, C.; Semmler, A.
Konferenzbeitrag
Conference Paper
2004 Process optimization using lithography simulation
Erdmann, A.
Konferenzbeitrag
Conference Paper
2004 Genetic algorithms to improve mask and illumination geometries in lithographic imaging systems
Fühner, T.; Erdmann, A.; Farkas, R.; Tollkühn, B.; Kokai, G.
Konferenzbeitrag
Conference Paper
2004 Genetic algorithms for geometry optimization in lithographic imaging systems
Fühner, T.; Erdmann, A.; Schnattinger, T.
Konferenzbeitrag
Conference Paper
2004 Enhanced model for the efficient 2D and 3D simulation of defective EUV masks
Evanschitzky, P.; Erdmann, A.
Konferenzbeitrag
Conference Paper
2004 Simulation is essential to successful design of modern semiconductors
Erdmann, A.
Zeitschriftenaufsatz
Journal Article
2004 The impact of EUV mask defects on lithographic process performance
Evanschitzky, P.; Erdmann, A.
Konferenzbeitrag
Conference Paper
2003 Rigorous simulation of exposure over nonplanar wafers
Erdmann, A.; Kalus, C.K.; Schmöller, T.; Klyonova, Y.; Sato, T.; Endo, A.; Shibata, T.; Kobayashi, Y.
Konferenzbeitrag
Conference Paper
2003 Mask and source optimization for lithographic imaging systems
Erdmann, A.; Farkas, R.; Fühner, T.; Tollkühn, B.; Kokai, G.
Konferenzbeitrag
Conference Paper
2003 Will Darwin's law help us to improve our resist models?
Tollkühn, B.; Fühner, T.; Matiut, D.; Erdmann, A.; Semmler, A.; Kuchler, B.; Kokai, B.
Konferenzbeitrag
Conference Paper
2003 Simulation of extreme ultraviolet masks with defective multilayers
Evanschitzky, P.; Erdmann, A.; Besacier, M.; Schiavone, P.
Konferenzbeitrag
Conference Paper
2003 Optical lithography for future technology generations
Erdmann, A.
Zeitschriftenaufsatz
Journal Article
2003 EUV mask simulation for AIMS
Windpassinger, R.; Rosenkranz, N.; Scherübl, T.; Evanschitzky, P.; Erdmann, A.; Zibold, A.
Konferenzbeitrag
Conference Paper
2003 Efficient simulation of light diffraction from 3-dimensional EUV-masks using field decomposition techniques
Erdmann, A.; Kalus, C.K.; Schmöller, T.; Wolter, A.
Konferenzbeitrag
Conference Paper
2003 Rigorous simulation of alignment for microlithography
Nikolaev, N.I.; Erdmann, A.
Zeitschriftenaufsatz
Journal Article
2003 New models for the simulation of post-exposure bake of chemically amplified resist
Matiut, D.; Erdmann, A.; Tollkühn, B.; Semmler, A.
Konferenzbeitrag
Conference Paper
2003 Rigorous simulation of defective EUV multilayer masks
Sambale, C.; Schmöller, T.; Erdmann, A.; Evanschitzky, P.; Kalus, C.
Konferenzbeitrag
Conference Paper
2002 Herstellung von optisch abgebildeten Strukturen mit einer Phasenschiebung von transmittierten Lichtanteilen
Erdmann, A.; Vial, A.
Patent
2002 New methods to calibrate simulation parameters for chemically amplified resists
Tollkuehn, B.; Erdmann, A.; Kivel, N.; Robertson, S.A.; Kang, D.; Hansen, S.G.; Fumar, P.A.; Tsann, B.C.; Hoppe, W.
Konferenzbeitrag
Conference Paper
2002 Modification of boundaries conditions in the FDTD algorithm for EUV masks modeling
Vial, A.; Erdmann, A.; Schmoeller, T.; Kalus, C.
Konferenzbeitrag
Conference Paper
2002 Enhancements in rigorous simulation of light diffraction from phase-shift masks
Erdmann, A.; Kachwala, N.
Konferenzbeitrag
Conference Paper
2001 The impact of exposure induced refractive index changes of photoresists on the photolithographic process
Erdmann, A.; Henderson, C.L.; Willson, C.G.
Zeitschriftenaufsatz
Journal Article
2001 Effect of copper on the breakthrough voltage of Poly-Si - Poly-Si capacitors
Boehringer, M.; Pillion, J.E.; Erdmann, V.; Rygula, M.; Winz, K.; Brauchle, P.; Aquino, D.; Zhang, H.; Zahka, J.; Zielonka, G.; Hauber, J.
Konferenzbeitrag
Conference Paper
2001 Trace analysis for 300 mm wafers and processes with total- reflection x-ray-fluorescence
Nutsch, A.; Erdmann, V.; Zielonka, G.; Pfitzner, L.; Ryssel, H.
Zeitschriftenaufsatz
Journal Article
2001 Optical simulation of 3D Mask effects
Rosenbusch, A.; Erdmann, A.; Friedrich, C.
Zeitschriftenaufsatz
Journal Article
2001 Benchmarking of available rigorous electromagnetic field (EMF) simulators for phase-shift mask applications
Kalus, C.; List, S.; Erdmann, A.; Gordon, R.; McCallum, M.; Semmler, A.
Zeitschriftenaufsatz
Journal Article
2001 3D-electromagnetic field simulation for Low-k1 lithography applications
Erdmann, A.; Gordon, R.; McCallum, M.; Rosenbusch, A.
Zeitschriftenaufsatz
Journal Article
2001 Comparison of simulation approaches for chemically amplified resists
Erdmann, A.; Henke, W.; Robertson, S.; Richter, E.; Tollkühn, B.; Hoppe, W.
Konferenzbeitrag
Conference Paper
2001 Automatic resist parameter calibration procedure for lithography simulation
Tollkuehn, B.; Hoepfl, M.; Erdmann, A.; Majoni, S.; Jess, M.
Konferenzbeitrag
Conference Paper
2001 Topography effects and wave aberrations in advanced PSM technology
Erdmann, A.
Konferenzbeitrag
Conference Paper
2000 Rigorous diffraction analysis for future mask technology
Erdmann, A.; Friedrich, C.
Konferenzbeitrag
Conference Paper
Diese Liste ist ein Auszug aus der Publikationsplattform Fraunhofer-Publica

This list has been generated from the publication platform Fraunhofer-Publica