Publications Computational Lithography and Optics

Jahr
Year
Titel/Autor:in
Title/Author
Publikationstyp
Publication Type
2025 Physics-informed deep learning for 3D modeling of light diffraction from optical metasurfaces
Medvedev, Vladimir; Erdmann, Andreas; Roßkopf, Andreas
Zeitschriftenaufsatz
Journal Article
2024 3D EUV Mask Simulator based on Physics-Informed Neural Networks: effects of polarization and illumination
Medvedev, Vladimir M.; Erdmann, Andreas; Roßkopf, Andreas
Konferenzbeitrag
Conference Paper
2023 3D Mask Simulation and Lithographic Imaging using Physics-Informed Neural Networks
Medvedev, Vlad; Erdmann, Andreas; Roßkopf, Andreas
Meeting Abstract
2022 Precise optical constants: determination and impact on metrology, simulation and development of EUV masks
Saadeh, Qais; Mesilhy, Hazem; Soltwisch, Victor; Erdmann, Andreas; Ciesielski, Richard; Lohr, Leonhard M.; Andrle, Anna; Philipsen, Vicky; Thakare, Devesh; Laubis, Christian; Scholze, Frank; Kolbe, Michael
Konferenzbeitrag
Conference Paper
2022 Attenuated phase shift masks: A wild card resolution enhancement for extreme ultraviolet lithography?
Erdmann, Andreas; Mesilhy, Hazem; Evanschitzky, Peter
Zeitschriftenaufsatz
Journal Article
2022 3D mask defect and repair simulation based on SEM images
Medvedev, Vladimir; Evanschitzky, Peter; Erdmann, Andreas
Konferenzbeitrag
Conference Paper
2021 Investigation of waveguide modes in EUV mask absorbers
Mesilhy, H.; Evanschitzky, P.; Bottiglieri, G.; Lare, C. Van; Setten, E. Van; Erdmann, A.
Zeitschriftenaufsatz
Journal Article
2021 Stochastic simulation and calibration of organometallic photoresists for extreme ultraviolet lithography
Belete, Z.; Bisschop, P. de; Welling, U.; Erdmann, A.
Zeitschriftenaufsatz
Journal Article
2021 Simulation of polychromatic effects in high NA EUV lithography
Erdmann, A.; Mesilhy, H.; Evanschitzky, P.; Saadeh, Q.; Soltwisch, V.; Bihr, S.; Zimmermann, J.; Philipsen, V.
Konferenzbeitrag
Conference Paper
2021 Modeling the impact of shrinkage effects on photoresist development
D'Silva, S.; Mülders, T.; Stock, H.-J.; Erdmann, A.
Zeitschriftenaufsatz
Journal Article
2021 Mask defect detection with hybrid deep learning network
Evanschitzky, P.; Auth, N.; Heil, T.; Hermanns, C.F.; Erdmann, A.
Zeitschriftenaufsatz
Journal Article
2021 Simulation study on EUV multilayer polarization effects
Bilalaj, L.; Mesilhy, H.; Erdmann, A.
Konferenzbeitrag
Conference Paper
2021 Accurate prediction of EUV lithographic images and 3D mask effects using generative networks
Awad, A.; Brendel, P.; Evanschitzky, P.; Woldeamanual, D.S.; Rosskopf, A.; Erdmann, A.
Zeitschriftenaufsatz
Journal Article
2021 Study of novel EUVL mask absorber candidates
Wu, M.; Thakare, D.; Marneffe, J.-F. de; Jaenen, P.; Souriau, L.; Opsomer, K.; Soulié, J.-P.; Erdmann, A.; Mesilhy, H.; Naujok, P.; Foltin, M.; Soltwisch, V.; Saadeh, Q.; Philipsen, V.
Zeitschriftenaufsatz
Journal Article
2020 Mask absorber for next generation EUV lithography
Wu, M.; Thakare, D.; Marneffe, J.-F. de; Jaenen, P.; Souriau, L.; Opsomer, K.; Soulié, J.-P.; Erdmann, A.; Mesilhy, H.; Naujok, P.; Foltin, M.; Soltwisch, V.; Saadeh, Q.; Philipsen, V.
Konferenzbeitrag
Conference Paper
2020 Perspectives and tradeoffs of absorber materials for high NA EUV lithography
Erdmann, A.; Mesilhy, H.; Evanschitzky, P.; Philipsen, V.; Timmermans, F.; Bauer, M.
Zeitschriftenaufsatz
Journal Article
2020 Pathfinding the perfect EUV mask: The role of the multilayer
Mesilhy, H.; Evanschitzky, P.; Bottiglieri, G.; Setten, E. van; Fliervoet, T.; Erdmann, A.
Konferenzbeitrag
Conference Paper
2019 Mask absorber development to enable next-generation EUVL
Philipsen, V.; Luong, K.V.; Opsomer, K.; Souriau, L.; Rip, J.; Detavernier, C.; Erdmann, A.; Evanschitzky, P.; Laubis, C.; Honicke, P.; Soltwisch, V.; Hendrickx, E.
Konferenzbeitrag
Conference Paper
2019 Lithographic effects due to particles on high-NA EUV mask pellicle
Devaraj, L.; Bottiglieri, G.; Erdmann, A.; Wählisch, F.; Kupers, M.; Setten, E. van; Fliervoet, T.
Konferenzbeitrag
Conference Paper
2019 3D mask effects in high NA EUV imaging
Erdmann, A.; Evanschitzky, P.; Bottiglieri, G.; Setten, E. van; Fliervoet, T.
Konferenzbeitrag
Conference Paper
2019 Attenuated phase shift mask for extreme ultraviolet: Can they mitigate three-dimensional mask effects?
Erdmann, A.; Evanschitzky, P.; Mesilhy, H.; Philipsen, V.; Hendrickx, E.; Bauer, M.
Zeitschriftenaufsatz
Journal Article
2019 Learned sensing: Jointly optimized microscope hardware for accurate image classification
Muthumbi, A.; Chaware, A.; Kim, K.; Zhou, K.C.; Konda, P.C.; Chen, R.; Judkewitz, B.; Erdmann, A.; Kappes, B.; Horstmeyer, R.
Zeitschriftenaufsatz
Journal Article
2018 Attenuated PSM for EUV
Erdmann, A.; Evanschitzky, P.; Mesilhy, H.; Philipsen, V.; Hendrickx, E.; Bauer, M.
Konferenzbeitrag
Conference Paper
2018 Novel EUV mask absorber evaluation in support of next-generation EUV imaging
Philipsen, V.; Luong, K.V.; Opsomer, K.; Detavernier, C.; Hendrickx, E.; Erdmann, A.; Evanschitzky, P.; Kruijs, R.W.E. van de; Heidarnia-Fathabad, Z.; Scholze, F.; Laubis, C.
Konferenzbeitrag
Conference Paper
2018 Modeling of block copolymer dry etching for directed self-assembly lithography
Belete, Zelalem; Bär, Eberhard; Erdmann, Andreas
Konferenzbeitrag
Conference Paper
2018 Application of deep learning algorithms for Lithographic mask characterization
Woldeamanual, D.S.; Erdmann, A.; Maier, A.
Konferenzbeitrag
Conference Paper
2018 Accurate determination of 3D PSF and resist effects in grayscale laser lithography
Onanuga, T.; Kaspar, C.; Sailer, H.; Erdmann, A.
Konferenzbeitrag
Conference Paper
2018 Fourier ptychography for lithography high NA systems
Dejkameh, A.; Erdmann, A.; Evanschitzky, P.; Ekinci, Y.
Konferenzbeitrag
Conference Paper
2018 Simulation study of illumination effects in high-NA EUV lithography
Ismail, M.; Evanschitzky, P.; Erdmann, A.; Bottiglieri, G.; Setten, E. van; Fliervoet, T.F.
Konferenzbeitrag
Conference Paper
2017 A physical model for innovative laser direct write lithography
Onanuga, T.; Rumler, M.; Erdmann, A.
Konferenzbeitrag
Conference Paper
2017 Levet-set-based inverse lithography under random field shape uncertainty in a vector Hopkins imaging model
Wu, X.; Fühner, T.; Erdmann, A.; Lam, E.Y.
Konferenzbeitrag
Conference Paper
2017 Efficient simulation of EUV pellicles
Evanschitzky, P.; Erdmann, A.
Konferenzbeitrag
Conference Paper
2017 Simulation flow and model verification for laser direct-write lithography
Onanuga, T.; Rumler, M.; Erdmann, A.
Zeitschriftenaufsatz
Journal Article
2017 Reducing EUV mask 3D effects by alternative metal absorbers
Philipsen, V.; Luong, K.V.; Souriau, L.; Hendrickx, E.; Erdmann, A.; Xu, D.; Evanschitzky, P.; Kruijs, R.W.E. van de; Edrisi, A.; Scholze, F.; Laubis, C.; Irmscher, M.; Naasz, S.; Reuter, C.
Konferenzbeitrag
Conference Paper
2017 Special issue on ptychography
Erdmann, A.; Situ, G.
Zeitschriftenaufsatz
Journal Article
2017 Reducing extreme ultraviolet mask three-dimensional effects by alternative metal absorbers
Philipsen, V.; Luong, K.V.; Souriau, L.; Erdmann, A.; Xu, D.; Evanschitzky, P.; Kruijs, R.W.E. van de; Edrisi, A.; Scholze, F.; Laubis, C.; Irmscher, M.; Naasz, S.; Reuter, C.; Hendrickx, E.
Zeitschriftenaufsatz
Journal Article
2017 Characterization and mitigation of 3D mask effects in extreme ultraviolet lithography
Erdmann, A.; Xu, D.; Evanschitzky, P.; Philipsen, V.; Luong, V.; Hendrickx, E.
Zeitschriftenaufsatz
Journal Article
2016 Challenges for predictive EUV mask modeling
Evanschitzky, Peter; Erdmann, Andreas
Vortrag
Presentation
2016 Efficient simulation of EUV pellicles
Evanschitzky, Peter; Erdmann, Andreas
Vortrag
Presentation
2016 Automated source/mask/directed self-assembly optimization using a self-adaptive hierarchical modeling approach
Fühner, T.; Michalak, P.; Wu, X.; Erdmann, A.
Konferenzbeitrag
Conference Paper
2016 Resolution enhancements for semiconductor lithography: A computational perspective
Erdmann, A.
Konferenzbeitrag
Conference Paper
2016 Extreme ultraviolet multilayer defect analysis and geometry reconstruction
Xu, D.; Evanschitzky, P.; Erdmann, A.
Zeitschriftenaufsatz
Journal Article
2016 3D simulation of light exposure and resist effects in laser direct write lithography
Onanuga, Temitope; Erdmann, Andreas
Konferenzbeitrag
Conference Paper
2016 Extending VLSI and alternative technology with optical and complementary lithography
Lai, K.; Erdmann, A.
Editorial
2016 Incorporating photomask shape uncertainty in computational lithography
Wu, X.; Liu, S.; Erdmann, A.; Lam, E.Y.
Konferenzbeitrag
Conference Paper
2016 Mask-induced best-focus shifts in deep ultraviolet and extreme ultraviolet lithography
Erdmann, A.; Evanschitzky, P.; Neumann, J.T.; Gräupner, P.
Zeitschriftenaufsatz
Journal Article
2015 Optical and EUV projection lithography: A computational view
Erdmann, A.; Fühner, T.; Evanschitzky, P.; Agudelo, V.; Freund, C.; Michalak, P.; Xu, D.B.
Zeitschriftenaufsatz
Journal Article
2015 Continuation of scaling with optical and complementary lithography. Editorial
Lai, K.F.; Erdmann, A.
Editorial
2015 Application of the transport of intensity equation to EUV multilayer defect analysis
Xu, D.; Evanschitzky, P.; Erdmann, A.
Konferenzbeitrag
Conference Paper
2015 Mask-induced best-focus-shifts in DUV and EUV lithography
Erdmann, A.; Evanschitzky, P.; Neumann, J.T.; Gräupner, P.
Konferenzbeitrag
Conference Paper
2015 Application of principal component analysis to EUV multilayer defect printing
Xu, D.; Evanschitzky, P.; Erdmann, A.
Konferenzbeitrag
Conference Paper
2015 Introduction to the special issue on optical lithography
Erdmann, A.; Shibuya, M.
Zeitschriftenaufsatz
Journal Article
2014 In situ aberration measurement method using a phase-shift ring mask
Wang, X.; Li, S.; Yang, J.; Tang, F.; Yan, G.; Erdmann, A.
Konferenzbeitrag
Conference Paper
2014 Lithographic process window optimization for mask aligner proximity lithography
Voelkel, R.; Vogler, U.; Bramati, A.; Erdmann, A.; Ünal, N.; Hofmann, U.; Hennemeyer, M.; Zoberbier, R.; Nguyen, D.; Brugger, J.
Konferenzbeitrag
Conference Paper
2014 A defocus measurement method for an in situ aberration measurement method using a phase-shift ring mask
Li, S.; Wang, X.; Yang, J.; Tang, F.; Yan, G.; Erdmann, A.
Konferenzbeitrag
Conference Paper
2014 Fast rigorous model for mask spectrum simulation and analysis of mask shadowing effects in EUV lithography
Liu, X.; Wang, X.; Li, S.; Yan, G.; Erdmann, A.
Konferenzbeitrag
Conference Paper
2014 Application of artificial neural networks to compact mask models in optical lithography simulation
Agudelo, V.; Fühner, T.; Erdmann, A.; Evanschitzky, P.
Zeitschriftenaufsatz
Journal Article
2014 Pixel-based defect detection from high-NA optical projection images
Xu, D.B.; Fühner, T.; Erdmann, A.
Zeitschriftenaufsatz
Journal Article
2014 Rigorous simulation and optimization of the lithography/directed self-assembly co-process
Fühner, T.; Welling, U.; Müller, M.; Erdmann, A.
Konferenzbeitrag
Conference Paper
2014 Aberration measurement technique based on an analytical linear model of a through-focus aerial image
Yan, G.; Wang, X.; Li, S.; Yang, J.; Xu, D.; Erdmann, A.
Zeitschriftenaufsatz
Journal Article
2014 Advances in lithography: Introduction to the feature. Editorial
Erdmann, A.; Liang, R.G.; Sezginer, A.; Smith, B.
Editorial
2014 Advances in lithography: Introduction to the feature. Editorial
Erdmann, A.; Liang, R.G.; Sezginer, A.; Smith, B.
Editorial
2014 Challenges and opportunities for process modeling in the nanotechnology era
Lorenz, J.K.; Baer, E.; Burenkov, A.; Erdmann, A.; Evanschitzky, P.; Pichler, P.
Zeitschriftenaufsatz
Journal Article
2014 Fast model for mask spectrum simulation and analysis of mask shadowing effects in extreme ultraviolet lithography
Liu, Xiaolei; Wang, Xiangzhao; Li, Sikun; Yan, Guanyong; Erdmann, A.
Zeitschriftenaufsatz
Journal Article
2013 Defect inspection and detection using optical image projection
Xu, D.; Li, S.; Wang, X.; Erdmann, A.
Vortrag
Presentation
2013 Modeling studies on alternative EUV mask concepts for higher NA
Erdmann, A.; Fühner, T.; Evanschitzky, P.; Neumann, J.T.; Ruoff, J.; Gräupner, P.
Konferenzbeitrag
Conference Paper
2013 Defect parameters retrieval based on optical projection images
Xu, D.; Li, S.; Wang, X.; Fühner, T.; Erdmann, A.
Konferenzbeitrag
Conference Paper
2013 Source mask optimization using real-coded genetic algorithms
Yang, C.; Wang, X.; Li, S.; Erdmann, A.
Konferenzbeitrag
Conference Paper
2013 High-order aberration measurement technique based on quadratic Zernike model with optimized source
Yang, J.; Wang, X.; Li, S.; Duan, L.; Yan, G.; Xu, D.; Bourov, A.Y.; Erdmann, A.
Zeitschriftenaufsatz
Journal Article
2013 Adaptive denoising method to improve aberration measurement performance
Yang, J.; Wang, X.; Li, S.; Duan, L.; Bourov, A.Y.; Erdmann, A.
Zeitschriftenaufsatz
Journal Article
2013 Application of artificial neural networks to compact mask models in optical lithography simulation
Agudelo, V.; Fühner, T.; Erdmann, A.; Evanschitzky, P.
Konferenzbeitrag
Conference Paper
2013 Modeling strategies for EUV mask multilayer defect dispositioning and repair
Erdmann, A.; Evanschitzky, P.; Bret, T.; Jonckheere, R.
Konferenzbeitrag
Conference Paper
2013 Efficient simulation of extreme ultraviolet multilayer defects with rigorous data base approach
Evanschitzky, Peter; Shao, Feng; Erdmann, Andreas
Zeitschriftenaufsatz
Journal Article
2013 In situ aberration measurement technique based on an aerial image with an optimized source
Yan, G.; Wang, X.; Li, S.; Yang, J.; Xu, D.; Duan, L.; Bourov, A.Y.; Erdmann, A.
Zeitschriftenaufsatz
Journal Article
2012 Advanced mask aligner lithography (AMALITH)
Völkel, R.; Vogler, U.; Bramati, A.; Weichelt, T.; Stürzebecher, L.; Zeitner, U.D.; Motzek, K.; Erdmann, A.; Hornung, M.; Zoberbier, R.
Konferenzbeitrag
Conference Paper
2012 Simulation of 3D inclined/rotated UV lithography and its application to microneedles
Liu, S.; Roeder, G.; Aygun, G.; Motzek, K.; Evanschitzky, P.; Erdmann, A.
Zeitschriftenaufsatz
Journal Article
2012 In-situ aberration measurement technique based on aerial image with optimized source
Yan, G.; Wang, X.; Li, S.; Yang, J.; Xu, D.; Duan, L.; Bourov, A.Y.; Erdmann, A.
Konferenzbeitrag
Conference Paper
2012 In situ aberration measurement technique based on quadratic Zernike model
Yang, J.; Wang, X.; Li, S.; Duan, L.; Yan, G.; Xu, D.; Bourov, A.Y.; Erdmann, A.
Konferenzbeitrag
Conference Paper
2012 Efficient simulation of EUV multilayer defects with rigorous data base approach
Evanschitzky, Peter; Shao, Feng; Erdmann, Andreas
Konferenzbeitrag
Conference Paper
2012 Analysis of EUV mask multilayer defect printing characteristics
Erdmann, A.; Evanschitzky, P.; Bret, T.; Jonckheerec, R.
Konferenzbeitrag
Conference Paper
2012 Mutual source, mask and projector pupil optimization
Fühner, T.; Evanschitzky, P.; Erdmann, A.
Konferenzbeitrag
Conference Paper
2012 Evaluation of various compact mask and imaging models for the efficient simulation of mask topography effects in immersion lithography
Agudelo, V.; Evanschitzky, P.; Erdmann, A.; Fühner, T.
Konferenzbeitrag
Conference Paper
2012 Imaging characteristics of binary and phase shift masks for EUV projection lithography
Erdmann, A.; Evanschitzky, P.
Konferenzbeitrag
Conference Paper
2012 Resonant metamaterials for contrast enhancement in optical lithography
Dobmann, S.; Shyroki, D.; Banzer, P.; Erdmann, A.; Peschel, U.
Zeitschriftenaufsatz
Journal Article
2012 Influence of two typical defects on the near-field optical properties of multilayer dielectric compression gratings
Jin, Y.X.; Guan, H.Y.; Kong, F.Y.; Wang, J.P.; Erdmann, A.; Liu, S.J.; Du, Y.; Shao, J.D.; He, H.B.; Yi, K.
Zeitschriftenaufsatz
Journal Article
2012 Resist properties required for 6.67 nm extreme ultraviolet lithography
Kozawa, T.; Erdmann, A.
Zeitschriftenaufsatz
Journal Article
2012 Mask aligner lithography simulation - From lithography simulation to process validation
Motzek, K.; Partel, S.; Bramati, A.; Hofmann, U.; Unal, N.; Hennemeyer, M.; Hornung, M.; Heindl, A.; Ruhland, M.; Erdmann, A.; Hudek, P.
Zeitschriftenaufsatz
Journal Article
2012 Rigorous electromagnetic field simulation of the impact of photomask line-edge and line-width roughness on lithographic processes
Rudolph, O.; Evanschitzky, P.; Erdmann, A.; Bär, E.; Lorenz, J.
Zeitschriftenaufsatz
Journal Article
2011 Compensation of mask induced aberrations by projector wavefront control
Evanschitzky, Peter; Shao, Feng; Fühner, Tim; Erdmann, Andreas
Konferenzbeitrag
Conference Paper
2011 Predictive modeling of EUV-lithography: The role of mask, optics, and photoresist effects
Erdmann, A.; Evanschitzky, P.; Shao, F.; Fühner, T.; Lorusso, G.; Hendrickx, E.; Goethals, A.M.; Jonckheere, R.; Bret, T.; Hofmann, T.
Konferenzbeitrag
Conference Paper
2011 Rigorous EMF simulation of the impact of photomask line-edge and line-width roughness on lithographic processes
Rudolph, O.H.; Evanschitzky, P.; Erdmann, A.; Bär, E.; Lorenz, J.
Konferenzbeitrag
Conference Paper
2011 Innovations in structured thin film design and fabrication for optical applications
Qi, H.; Wang, J.; Erdmann, A.; Jin, Y.; Shao, J.; Fan, Z.
Konferenzbeitrag
Conference Paper
2011 Feasibility study of chemically amplified resists for short wavelength extreme ultraviolet lithography
Kozawa, T.; Erdmann, A.
Zeitschriftenaufsatz
Journal Article
2011 Determination of the dill parameters of thick positive resist for use in modeling applications
Roeder, G.; Liu, S.; Aygun, G.; Evanschitzky, P.; Erdmann, A.; Schellenberger, M.; Pfitzner, L.
Konferenzbeitrag
Conference Paper
2011 Rigorous EMF simulation of the impact of photomask line-edge and line-width roughness on lithographic processes
Rudolph, Oliver; Evanschitzky, Peter; Erdmann, Andreas; Bär, Eberhard; Lorenz, Jürgen
Poster
2011 Accuracy and performance of 3D mask models in optical projection lithography
Agudelo, V.; Evanschitzky, P.; Erdmann, A.; Fühner, T.; Shao, F.; Limmer, S.; Fey, D.
Konferenzbeitrag
Conference Paper
2011 Image simulation of projection systems in photolithography
Evanschitzky, Peter; Fühner, Tim; Erdmann, Andreas
Konferenzbeitrag
Conference Paper
2011 Numerical optimization of illumination and mask layout for the enlargement of process windows and for the control of photoresist profiles in proximity printing
Motzek, Kristian; Partel, Stefan; Vogler, Uwe; Erdmann, Andreas
Konferenzbeitrag
Conference Paper
2011 Influence of geometry variations and defects on the near-field optical properties of pulsed compression gratings
Wang, J.; Erdmann, A.; Liu, S.; Shao, J.; Jin, Y.; He, H.; Yi, K.
Konferenzbeitrag
Conference Paper
2011 Modellierung und Simulation bei Mask Aligner Lithographie (Source-Mask Optimization)
Vogler, U.; Bramati, A.; Völkel, R.; Hornung, M.; Zoberbier, R.; Motzek, M.; Erdmann, A.; Stürzebecher, L.; Zeitner, U.
Zeitschriftenaufsatz
Journal Article
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