Publications Computational Lithography and Optics

Jahr Year	Titel/Autor:in Title/Author	Publikationstyp Publication Type
2021	Study of novel EUVL mask absorber candidates Wu, M.; Thakare, D.; Marneffe, J.-F. de; Jaenen, P.; Souriau, L.; Opsomer, K.; Soulié, J.-P.; Erdmann, A.; Mesilhy, H.; Naujok, P.; Foltin, M.; Soltwisch, V.; Saadeh, Q.; Philipsen, V.	Zeitschriftenaufsatz Journal Article
2021	Simulation of polychromatic effects in high NA EUV lithography Erdmann, A.; Mesilhy, H.; Evanschitzky, P.; Saadeh, Q.; Soltwisch, V.; Bihr, S.; Zimmermann, J.; Philipsen, V.	Konferenzbeitrag Conference Paper
2021	Modeling the impact of shrinkage effects on photoresist development D'Silva, S.; Mülders, T.; Stock, H.-J.; Erdmann, A.	Zeitschriftenaufsatz Journal Article
2021	Accurate prediction of EUV lithographic images and 3D mask effects using generative networks Awad, A.; Brendel, P.; Evanschitzky, P.; Woldeamanual, D.S.; Rosskopf, A.; Erdmann, A.	Zeitschriftenaufsatz Journal Article
2021	Investigation of waveguide modes in EUV mask absorbers Mesilhy, H.; Evanschitzky, P.; Bottiglieri, G.; Lare, C. Van; Setten, E. Van; Erdmann, A.	Zeitschriftenaufsatz Journal Article
2021	Stochastic simulation and calibration of organometallic photoresists for extreme ultraviolet lithography Belete, Z.; Bisschop, P. de; Welling, U.; Erdmann, A.	Zeitschriftenaufsatz Journal Article
2021	Simulation study on EUV multilayer polarization effects Bilalaj, L.; Mesilhy, H.; Erdmann, A.	Konferenzbeitrag Conference Paper
2021	Mask defect detection with hybrid deep learning network Evanschitzky, P.; Auth, N.; Heil, T.; Hermanns, C.F.; Erdmann, A.	Zeitschriftenaufsatz Journal Article
2020	Mask absorber for next generation EUV lithography Wu, M.; Thakare, D.; Marneffe, J.-F. de; Jaenen, P.; Souriau, L.; Opsomer, K.; Soulié, J.-P.; Erdmann, A.; Mesilhy, H.; Naujok, P.; Foltin, M.; Soltwisch, V.; Saadeh, Q.; Philipsen, V.	Konferenzbeitrag Conference Paper
2020	Perspectives and tradeoffs of absorber materials for high NA EUV lithography Erdmann, A.; Mesilhy, H.; Evanschitzky, P.; Philipsen, V.; Timmermans, F.; Bauer, M.	Zeitschriftenaufsatz Journal Article
2020	Pathfinding the perfect EUV mask: The role of the multilayer Mesilhy, H.; Evanschitzky, P.; Bottiglieri, G.; Setten, E. van; Fliervoet, T.; Erdmann, A.	Konferenzbeitrag Conference Paper
2019	Mask absorber development to enable next-generation EUVL Philipsen, V.; Luong, K.V.; Opsomer, K.; Souriau, L.; Rip, J.; Detavernier, C.; Erdmann, A.; Evanschitzky, P.; Laubis, C.; Honicke, P.; Soltwisch, V.; Hendrickx, E.	Konferenzbeitrag Conference Paper
2019	3D mask effects in high NA EUV imaging Erdmann, A.; Evanschitzky, P.; Bottiglieri, G.; Setten, E. van; Fliervoet, T.	Konferenzbeitrag Conference Paper
2019	Learned sensing: Jointly optimized microscope hardware for accurate image classification Muthumbi, A.; Chaware, A.; Kim, K.; Zhou, K.C.; Konda, P.C.; Chen, R.; Judkewitz, B.; Erdmann, A.; Kappes, B.; Horstmeyer, R.	Zeitschriftenaufsatz Journal Article
2019	Lithographic effects due to particles on high-NA EUV mask pellicle Devaraj, L.; Bottiglieri, G.; Erdmann, A.; Wählisch, F.; Kupers, M.; Setten, E. van; Fliervoet, T.	Konferenzbeitrag Conference Paper
2019	Attenuated phase shift mask for extreme ultraviolet: Can they mitigate three-dimensional mask effects? Erdmann, A.; Evanschitzky, P.; Mesilhy, H.; Philipsen, V.; Hendrickx, E.; Bauer, M.	Zeitschriftenaufsatz Journal Article
2018	Simulation study of illumination effects in high-NA EUV lithography Ismail, M.; Evanschitzky, P.; Erdmann, A.; Bottiglieri, G.; Setten, E. van; Fliervoet, T.F.	Konferenzbeitrag Conference Paper
2018	Novel EUV mask absorber evaluation in support of next-generation EUV imaging Philipsen, V.; Luong, K.V.; Opsomer, K.; Detavernier, C.; Hendrickx, E.; Erdmann, A.; Evanschitzky, P.; Kruijs, R.W.E. van de; Heidarnia-Fathabad, Z.; Scholze, F.; Laubis, C.	Konferenzbeitrag Conference Paper
2018	Accurate determination of 3D PSF and resist effects in grayscale laser lithography Onanuga, T.; Kaspar, C.; Sailer, H.; Erdmann, A.	Konferenzbeitrag Conference Paper
2018	Fourier ptychography for lithography high NA systems Dejkameh, A.; Erdmann, A.; Evanschitzky, P.; Ekinci, Y.	Konferenzbeitrag Conference Paper
2018	Modeling of block copolymer dry etching for directed self-assembly lithography Belete, Zelalem; Bär, Eberhard; Erdmann, Andreas	Konferenzbeitrag Conference Paper
2018	Application of deep learning algorithms for Lithographic mask characterization Woldeamanual, D.S.; Erdmann, A.; Maier, A.	Konferenzbeitrag Conference Paper
2018	Attenuated PSM for EUV Erdmann, A.; Evanschitzky, P.; Mesilhy, H.; Philipsen, V.; Hendrickx, E.; Bauer, M.	Konferenzbeitrag Conference Paper
2017	Simulation flow and model verification for laser direct-write lithography Onanuga, T.; Rumler, M.; Erdmann, A.	Zeitschriftenaufsatz Journal Article
2017	Levet-set-based inverse lithography under random field shape uncertainty in a vector Hopkins imaging model Wu, X.; Fühner, T.; Erdmann, A.; Lam, E.Y.	Konferenzbeitrag Conference Paper
2017	Reducing EUV mask 3D effects by alternative metal absorbers Philipsen, V.; Luong, K.V.; Souriau, L.; Hendrickx, E.; Erdmann, A.; Xu, D.; Evanschitzky, P.; Kruijs, R.W.E. van de; Edrisi, A.; Scholze, F.; Laubis, C.; Irmscher, M.; Naasz, S.; Reuter, C.	Konferenzbeitrag Conference Paper
2017	Efficient simulation of EUV pellicles Evanschitzky, P.; Erdmann, A.	Konferenzbeitrag Conference Paper
2017	Characterization and mitigation of 3D mask effects in extreme ultraviolet lithography Erdmann, A.; Xu, D.; Evanschitzky, P.; Philipsen, V.; Luong, V.; Hendrickx, E.	Zeitschriftenaufsatz Journal Article
2017	A physical model for innovative laser direct write lithography Onanuga, T.; Rumler, M.; Erdmann, A.	Konferenzbeitrag Conference Paper
2017	Special issue on ptychography Erdmann, A.; Situ, G.	Zeitschriftenaufsatz Journal Article
2017	Reducing extreme ultraviolet mask three-dimensional effects by alternative metal absorbers Philipsen, V.; Luong, K.V.; Souriau, L.; Erdmann, A.; Xu, D.; Evanschitzky, P.; Kruijs, R.W.E. van de; Edrisi, A.; Scholze, F.; Laubis, C.; Irmscher, M.; Naasz, S.; Reuter, C.; Hendrickx, E.	Zeitschriftenaufsatz Journal Article
2016	Resolution enhancements for semiconductor lithography: A computational perspective Erdmann, A.	Konferenzbeitrag Conference Paper
2016	Automated source/mask/directed self-assembly optimization using a self-adaptive hierarchical modeling approach Fühner, T.; Michalak, P.; Wu, X.; Erdmann, A.	Konferenzbeitrag Conference Paper
2016	Extreme ultraviolet multilayer defect analysis and geometry reconstruction Xu, D.; Evanschitzky, P.; Erdmann, A.	Zeitschriftenaufsatz Journal Article
2016	3D simulation of light exposure and resist effects in laser direct write lithography Onanuga, Temitope; Erdmann, Andreas	Konferenzbeitrag Conference Paper
2016	Extending VLSI and alternative technology with optical and complementary lithography Lai, K.; Erdmann, A.	Editorial
2016	Incorporating photomask shape uncertainty in computational lithography Wu, X.; Liu, S.; Erdmann, A.; Lam, E.Y.	Konferenzbeitrag Conference Paper
2016	Challenges for predictive EUV mask modeling Evanschitzky, Peter; Erdmann, Andreas	Vortrag Presentation
2016	Mask-induced best-focus shifts in deep ultraviolet and extreme ultraviolet lithography Erdmann, A.; Evanschitzky, P.; Neumann, J.T.; Gräupner, P.	Zeitschriftenaufsatz Journal Article
2016	Efficient simulation of EUV pellicles Evanschitzky, Peter; Erdmann, Andreas	Vortrag Presentation
2015	Application of principal component analysis to EUV multilayer defect printing Xu, D.; Evanschitzky, P.; Erdmann, A.	Konferenzbeitrag Conference Paper
2015	Continuation of scaling with optical and complementary lithography. Editorial Lai, K.F.; Erdmann, A.	Editorial
2015	Mask-induced best-focus-shifts in DUV and EUV lithography Erdmann, A.; Evanschitzky, P.; Neumann, J.T.; Gräupner, P.	Konferenzbeitrag Conference Paper
2015	Application of the transport of intensity equation to EUV multilayer defect analysis Xu, D.; Evanschitzky, P.; Erdmann, A.	Konferenzbeitrag Conference Paper
2015	Optical and EUV projection lithography: A computational view Erdmann, A.; Fühner, T.; Evanschitzky, P.; Agudelo, V.; Freund, C.; Michalak, P.; Xu, D.B.	Zeitschriftenaufsatz Journal Article
2015	Introduction to the special issue on optical lithography Erdmann, A.; Shibuya, M.	Zeitschriftenaufsatz Journal Article
2014	Pixel-based defect detection from high-NA optical projection images Xu, D.B.; Fühner, T.; Erdmann, A.	Zeitschriftenaufsatz Journal Article
2014	Advances in lithography: Introduction to the feature. Editorial Erdmann, A.; Liang, R.G.; Sezginer, A.; Smith, B.	Editorial
2014	Application of artificial neural networks to compact mask models in optical lithography simulation Agudelo, V.; Fühner, T.; Erdmann, A.; Evanschitzky, P.	Zeitschriftenaufsatz Journal Article
2014	Rigorous simulation and optimization of the lithography/directed self-assembly co-process Fühner, T.; Welling, U.; Müller, M.; Erdmann, A.	Konferenzbeitrag Conference Paper
2014	A defocus measurement method for an in situ aberration measurement method using a phase-shift ring mask Li, S.; Wang, X.; Yang, J.; Tang, F.; Yan, G.; Erdmann, A.	Konferenzbeitrag Conference Paper
2014	In situ aberration measurement method using a phase-shift ring mask Wang, X.; Li, S.; Yang, J.; Tang, F.; Yan, G.; Erdmann, A.	Konferenzbeitrag Conference Paper
2014	Advances in lithography: Introduction to the feature. Editorial Erdmann, A.; Liang, R.G.; Sezginer, A.; Smith, B.	Editorial
2014	Challenges and opportunities for process modeling in the nanotechnology era Lorenz, J.K.; Baer, E.; Burenkov, A.; Erdmann, A.; Evanschitzky, P.; Pichler, P.	Zeitschriftenaufsatz Journal Article
2014	Aberration measurement technique based on an analytical linear model of a through-focus aerial image Yan, G.; Wang, X.; Li, S.; Yang, J.; Xu, D.; Erdmann, A.	Zeitschriftenaufsatz Journal Article
2014	Lithographic process window optimization for mask aligner proximity lithography Voelkel, R.; Vogler, U.; Bramati, A.; Erdmann, A.; Ünal, N.; Hofmann, U.; Hennemeyer, M.; Zoberbier, R.; Nguyen, D.; Brugger, J.	Konferenzbeitrag Conference Paper
2014	Fast model for mask spectrum simulation and analysis of mask shadowing effects in extreme ultraviolet lithography Liu, Xiaolei; Wang, Xiangzhao; Li, Sikun; Yan, Guanyong; Erdmann, A.	Zeitschriftenaufsatz Journal Article
2014	Fast rigorous model for mask spectrum simulation and analysis of mask shadowing effects in EUV lithography Liu, X.; Wang, X.; Li, S.; Yan, G.; Erdmann, A.	Konferenzbeitrag Conference Paper
2013	Defect inspection and detection using optical image projection Xu, D.; Li, S.; Wang, X.; Erdmann, A.	Vortrag Presentation
2013	In situ aberration measurement technique based on an aerial image with an optimized source Yan, G.; Wang, X.; Li, S.; Yang, J.; Xu, D.; Duan, L.; Bourov, A.Y.; Erdmann, A.	Zeitschriftenaufsatz Journal Article
2013	Modeling studies on alternative EUV mask concepts for higher NA Erdmann, A.; Fühner, T.; Evanschitzky, P.; Neumann, J.T.; Ruoff, J.; Gräupner, P.	Konferenzbeitrag Conference Paper
2013	Efficient simulation of extreme ultraviolet multilayer defects with rigorous data base approach Evanschitzky, Peter; Shao, Feng; Erdmann, Andreas	Zeitschriftenaufsatz Journal Article
2013	Modeling strategies for EUV mask multilayer defect dispositioning and repair Erdmann, A.; Evanschitzky, P.; Bret, T.; Jonckheere, R.	Konferenzbeitrag Conference Paper
2013	Source mask optimization using real-coded genetic algorithms Yang, C.; Wang, X.; Li, S.; Erdmann, A.	Konferenzbeitrag Conference Paper
2013	High-order aberration measurement technique based on quadratic Zernike model with optimized source Yang, J.; Wang, X.; Li, S.; Duan, L.; Yan, G.; Xu, D.; Bourov, A.Y.; Erdmann, A.	Zeitschriftenaufsatz Journal Article
2013	Defect parameters retrieval based on optical projection images Xu, D.; Li, S.; Wang, X.; Fühner, T.; Erdmann, A.	Konferenzbeitrag Conference Paper
2013	Adaptive denoising method to improve aberration measurement performance Yang, J.; Wang, X.; Li, S.; Duan, L.; Bourov, A.Y.; Erdmann, A.	Zeitschriftenaufsatz Journal Article
2013	Application of artificial neural networks to compact mask models in optical lithography simulation Agudelo, V.; Fühner, T.; Erdmann, A.; Evanschitzky, P.	Konferenzbeitrag Conference Paper
2012	Advanced mask aligner lithography (AMALITH) Völkel, R.; Vogler, U.; Bramati, A.; Weichelt, T.; Stürzebecher, L.; Zeitner, U.D.; Motzek, K.; Erdmann, A.; Hornung, M.; Zoberbier, R.	Konferenzbeitrag Conference Paper
2012	Resist properties required for 6.67 nm extreme ultraviolet lithography Kozawa, T.; Erdmann, A.	Zeitschriftenaufsatz Journal Article
2012	Simulation of 3D inclined/rotated UV lithography and its application to microneedles Liu, S.; Roeder, G.; Aygun, G.; Motzek, K.; Evanschitzky, P.; Erdmann, A.	Zeitschriftenaufsatz Journal Article
2012	In-situ aberration measurement technique based on aerial image with optimized source Yan, G.; Wang, X.; Li, S.; Yang, J.; Xu, D.; Duan, L.; Bourov, A.Y.; Erdmann, A.	Konferenzbeitrag Conference Paper
2012	Influence of two typical defects on the near-field optical properties of multilayer dielectric compression gratings Jin, Y.X.; Guan, H.Y.; Kong, F.Y.; Wang, J.P.; Erdmann, A.; Liu, S.J.; Du, Y.; Shao, J.D.; He, H.B.; Yi, K.	Zeitschriftenaufsatz Journal Article
2012	In situ aberration measurement technique based on quadratic Zernike model Yang, J.; Wang, X.; Li, S.; Duan, L.; Yan, G.; Xu, D.; Bourov, A.Y.; Erdmann, A.	Konferenzbeitrag Conference Paper
2012	Analysis of EUV mask multilayer defect printing characteristics Erdmann, A.; Evanschitzky, P.; Bret, T.; Jonckheerec, R.	Konferenzbeitrag Conference Paper
2012	Imaging characteristics of binary and phase shift masks for EUV projection lithography Erdmann, A.; Evanschitzky, P.	Konferenzbeitrag Conference Paper
2012	Mask aligner lithography simulation - From lithography simulation to process validation Motzek, K.; Partel, S.; Bramati, A.; Hofmann, U.; Unal, N.; Hennemeyer, M.; Hornung, M.; Heindl, A.; Ruhland, M.; Erdmann, A.; Hudek, P.	Zeitschriftenaufsatz Journal Article
2012	Rigorous electromagnetic field simulation of the impact of photomask line-edge and line-width roughness on lithographic processes Rudolph, O.; Evanschitzky, P.; Erdmann, A.; Bär, E.; Lorenz, J.	Zeitschriftenaufsatz Journal Article
2012	Mutual source, mask and projector pupil optimization Fühner, T.; Evanschitzky, P.; Erdmann, A.	Konferenzbeitrag Conference Paper
2012	Evaluation of various compact mask and imaging models for the efficient simulation of mask topography effects in immersion lithography Agudelo, V.; Evanschitzky, P.; Erdmann, A.; Fühner, T.	Konferenzbeitrag Conference Paper
2012	Efficient simulation of EUV multilayer defects with rigorous data base approach Evanschitzky, Peter; Shao, Feng; Erdmann, Andreas	Konferenzbeitrag Conference Paper
2012	Resonant metamaterials for contrast enhancement in optical lithography Dobmann, S.; Shyroki, D.; Banzer, P.; Erdmann, A.; Peschel, U.	Zeitschriftenaufsatz Journal Article
2011	Modeling of mask diffraction and projection imaging for advanced optical and EUV lithography Erdmann, A.; Shao, F.; Agudelo, V.; Fühner, T.; Evanschitzky, P.	Zeitschriftenaufsatz Journal Article
2011	Computational algorithms for optimizing mask layouts in proximity printing Motzek, K.; Vogler, U.; Hennemeyer, M.; Hornung, M.; Voelkel, R.; Erdmann, A.; Meliorisz, B.	Zeitschriftenaufsatz Journal Article
2011	Innovations in structured thin film design and fabrication for optical applications Qi, H.; Wang, J.; Erdmann, A.; Jin, Y.; Shao, J.; Fan, Z.	Konferenzbeitrag Conference Paper
2011	Rigorous EMF simulation of the impact of photomask line-edge and line-width roughness on lithographic processes Rudolph, O.H.; Evanschitzky, P.; Erdmann, A.; Bär, E.; Lorenz, J.	Konferenzbeitrag Conference Paper
2011	Compensation of mask induced aberrations by projector wavefront control Evanschitzky, Peter; Shao, Feng; Fühner, Tim; Erdmann, Andreas	Konferenzbeitrag Conference Paper
2011	Feasibility study of chemically amplified resists for short wavelength extreme ultraviolet lithography Kozawa, T.; Erdmann, A.	Zeitschriftenaufsatz Journal Article
2011	Determination of the dill parameters of thick positive resist for use in modeling applications Roeder, G.; Liu, S.; Aygun, G.; Evanschitzky, P.; Erdmann, A.; Schellenberger, M.; Pfitzner, L.	Konferenzbeitrag Conference Paper
2011	Image simulation of projection systems in photolithography Evanschitzky, Peter; Fühner, Tim; Erdmann, Andreas	Konferenzbeitrag Conference Paper
2011	Modellierung und Simulation bei Mask Aligner Lithographie (Source-Mask Optimization) Vogler, U.; Bramati, A.; Völkel, R.; Hornung, M.; Zoberbier, R.; Motzek, M.; Erdmann, A.; Stürzebecher, L.; Zeitner, U.	Zeitschriftenaufsatz Journal Article
2011	Accuracy and performance of 3D mask models in optical projection lithography Agudelo, V.; Evanschitzky, P.; Erdmann, A.; Fühner, T.; Shao, F.; Limmer, S.; Fey, D.	Konferenzbeitrag Conference Paper
2011	Predictive modeling of EUV-lithography: The role of mask, optics, and photoresist effects Erdmann, A.; Evanschitzky, P.; Shao, F.; Fühner, T.; Lorusso, G.; Hendrickx, E.; Goethals, A.M.; Jonckheere, R.; Bret, T.; Hofmann, T.	Konferenzbeitrag Conference Paper
2011	Influence of geometry variations and defects on the near-field optical properties of pulsed compression gratings Wang, J.; Erdmann, A.; Liu, S.; Shao, J.; Jin, Y.; He, H.; Yi, K.	Konferenzbeitrag Conference Paper
2011	Numerical optimization of illumination and mask layout for the enlargement of process windows and for the control of photoresist profiles in proximity printing Motzek, Kristian; Partel, Stefan; Vogler, Uwe; Erdmann, Andreas	Konferenzbeitrag Conference Paper
2011	Rigorous EMF simulation of the impact of photomask line-edge and line-width roughness on lithographic processes Rudolph, Oliver; Evanschitzky, Peter; Erdmann, Andreas; Bär, Eberhard; Lorenz, Jürgen	Poster
2011	Analytical model for EUV mask diffraction field calculation Cao, Y.; Wang, X.; Erdmann, A.; Bu, P.; Bu, Y.	Konferenzbeitrag Conference Paper
2010	Topography-aware BARC optimization for double patterning Liu, S.; Fühner, T.; Shao, F.; Barenbaum, A.; Jahn, J.; Erdmann, A.	Konferenzbeitrag Conference Paper
2010	Rigorous EMF simulation of absorber shape variations and their impact on lithographic processes Rahimi, Z.; Erdmann, A.; Evanschitzky, P.; Pflaum, C.	Konferenzbeitrag Conference Paper
2010	Acid diffusion effects between resists in freezing processes used for contact hole patterning Fuhrmann, J.; Fiebach, A.; Erdmann, A.; Trefonas, P.	Konferenzbeitrag Conference Paper

Diese Liste ist ein Auszug aus der Publikationsplattform Fraunhofer-Publica

This list has been generated from the publication platform Fraunhofer-Publica

Jahr Year	Titel/Autor:in Title/Author	Publikationstyp Publication Type
2010	Efficient simulation of three-dimensional EUV masks for rigorous source mask optimization and mask induced imaging artifact analysis Evanschitzky, P.; Fühner, T.; Shao, F.; Erdmann, A.	Konferenzbeitrag Conference Paper
2010	Mask diffraction analysis and optimization for extreme ultraviolet masks Erdmann, A.; Evanschitzky, P.; Fühner, T.	Zeitschriftenaufsatz Journal Article
2010	Modeling of exploration of reversible contrast enhacement layers for double exposure lithography Shao, F.; Cooper, G.D.; Chen, Z.; Erdmann, A.	Konferenzbeitrag Conference Paper
2010	Fast and highly accurate simulation of the printing behavior of EUV multilayer defects based on different models Shao, F.; Evanschitzky, P.; Motzek, K.; Erdmann, A.	Konferenzbeitrag Conference Paper
2010	Modeling of double patterning interactions in litho-cure-litho-etch (LCLE) processes Erdmann, A.; Shao, F.; Fuhrmann, J.; Fiebach, A.; Patsis, G.P.; Trefonas, P.	Konferenzbeitrag Conference Paper
2010	Extraordinary low transmission of a metamaterial for application in lithography Dobmann, S.; Ploss, D.; Reibold, D.; Erdmann, A.; Peschel, U.	Konferenzbeitrag Conference Paper
2010	Optimization of illumination pupils and mask structures for proximity printing Motzek, K.; Bich, A.; Erdmann, A.; Hornung, M.; Hennemeyer, M.; Meliorisz, B.; Hofmann, U.; Ünal, N.; Völkel, R.; Partel, S.; Hudek, P.	Konferenzbeitrag Conference Paper
2010	Characterization of the scattering effect of complex mask geometries with surface roughness Rahimi, Z.; Erdmann, A.; Pflaum, C.	Konferenzbeitrag Conference Paper
2010	Mask and wafer topography effects in optical and EUV-lithography Erdmann, A.; Shao, F.; Evanschitzky, P.; Fühner, T.	Konferenzbeitrag Conference Paper
2010	Mask-topography-induced phase effects and wave aberrations in optical and extreme ultraviolet lithography Erdmann, A.; Shao, F.; Evanschitzky, P.; Fühner, T.	Konferenzbeitrag Conference Paper
2009	Extraordinary low transmission effects for ultra-thin patterned metal films Reibold, D.; Shao, F.; Erdmann, A.; Peschel, U.	Zeitschriftenaufsatz Journal Article
2009	Rigorous diffraction simulations of topographic wafer stacks in double patterning Feng, S.; Evanschitzky, P.; Fühner, T.; Erdmann, A.	Konferenzbeitrag Conference Paper
2009	A model of self-limiting residual acid diffusion for pattern doubling Fuhrmann, J.; Fiebach, A.; Uhle, M.; Erdmann, A.; Szmanda, C.R.; Truong, C.	Konferenzbeitrag Conference Paper
2009	Lithography simulation: Modeling techniques and selected applications Erdmann, A.; Fühner, T.; Shao, F.; Evanschitzky, P.	Konferenzbeitrag Conference Paper
2009	Lithographic importance of base diffusion in chemically amplified photoresists Schnattinger, T.; Erdmann, A.	Konferenzbeitrag Conference Paper
2009	Advanced lithography models for strict process control in the 32 nm technology node Patsis, G.P.; Drygiannakis, D.; Raptis, I.; Gogolides, E.; Erdmann, A.	Konferenzbeitrag Conference Paper
2009	Finite Integration (FI) method for modelling optical waves in lithography masks Rahimi, Z.; Erdmann, A.; Pflaum, C.	Konferenzbeitrag Conference Paper
2009	Extended Abbe approach for fast and accurate lithography imaging simulations Evanschitzky, P.; Erdmann, A.; Fühner, T.	Konferenzbeitrag Conference Paper
2009	Efficient analysis of three dimensional EUV mask imaging artifacts using the waveguide decomposition method Shao, F.; Evanschitzky, P.; Fühner, T.; Erdmann, A.	Konferenzbeitrag Conference Paper
2009	Mask diffraction analysis and optimization for EUV masks Erdmann, A.; Evanschitzky, P.; Fühner, T.	Konferenzbeitrag Conference Paper
2009	Efficient simulation and optimization of wafer topographies in double patterning Shao, F.; Evanschitzky, P.; Fühner, T.; Erdmann, A.	Konferenzbeitrag Conference Paper
2009	Photomasks for semiconductor lithography: From simple shadow casters to complex 3D scattering objects Erdmann, A.; Reibold, D.; Fühner, T.; Evanschitzky, P.	Konferenzbeitrag Conference Paper
2009	Exploration of linear and non-linear double exposure techniques by simulation Petersen, J.S.; Greenway, R.T.; Fühner, T.; Evanschitzky, P.; Shao, F.; Erdmann, A.	Konferenzbeitrag Conference Paper
2008	On the stability of fully depleted SOI MOSFETs under lithography process variations Kampen, C.; Fühner, T.; Burenkov, A.; Erdmann, A.; Lorenz, J.; Ryssel, H.	Konferenzbeitrag Conference Paper
2008	Photomasks for semiconductor lithography: From simple shadow casters to complex 3D scattering objects Erdmann, A.; Reibold, D.; Fühner, T.; Evanschitzky, P.	Konferenzbeitrag Conference Paper
2008	Optimization of mask absorber stacks and illumination settings for contact hole imaging Erdmann, A.; Fühner, T.; Evanschitzky, P.	Konferenzbeitrag Conference Paper
2008	A simulation study on the impact of lithographic process variations on CMOS device performance Fühner, T.; Kampen, C.; Kodrasi, I.; Burenkov, A.; Erdmann, A.	Konferenzbeitrag Conference Paper
2008	Increasing the predictability of AIMSTM measurements by coupling to resist simulations Meliorisz, B.; Erdmann, A.; Schnattinger, T.; Strößner, U.; Scherübl, T.; Bisschop, P. de; Philipsen, V.	Konferenzbeitrag Conference Paper
2008	Rigorous electromagnetic field simulation of two-beam interference exposures for the exploration of double patterning and double exposure scenarios Erdmann, A.; Evanschitzky, P.; Fühner, T.; Schnattinger, T.; Xu, C.B.; Szmanda, C.	Konferenzbeitrag Conference Paper
2008	Fast rigorous simulation of mask diffraction using the waveguide method with parallelized decomposition technique Shao, F.; Evanschitzky, P.; Reibold, D.; Erdmann, A.	Konferenzbeitrag Conference Paper
2008	Investigation of high-resolution contact printing Meliorisz, B.; Partel, S.; Schnattinger, T.; Fühner, T.; Erdmann, A.; Hudek, P.	Konferenzbeitrag Conference Paper
2008	A comprehensive resist model for the prediction of line-edge roughness material and process dependencies in optical lithography Schnattinger, T.; Erdmann, A.	Konferenzbeitrag Conference Paper
2008	Benchmark of rigorous methods for electromagnetic field simulations Burger, S.; Zschiedrich, L.; Schmidt, F.; Evanschitzky, P.; Erdmann, A.	Konferenzbeitrag Conference Paper
2008	Simulation-based EUV source and mask optimization Fühner, T.; Erdmann, A.; Evanschitzky, P.	Konferenzbeitrag Conference Paper
2007	Simulation of mask proximity printing Meliorisz, B.; Erdmann, A.	Zeitschriftenaufsatz Journal Article
2007	Dr.LiTHO - a development and research lithography simulator Fühner, T.; Schnattinger, T.; Ardelean, G.; Erdmann, A.	Konferenzbeitrag Conference Paper
2007	Memetic algorithms: Parametric optimization for microlithography Dürr, C.; Fühner, T.; Tollkühn, B.; Erdmann, A.; Kokai, G.	Aufsatz in Buch Book Article
2007	Direct optimization approach for lithographic process conditions Fühner, T.; Erdmann, A.; Seifert, S.	Zeitschriftenaufsatz Journal Article
2007	Rigorous electromagnetic field mask modeling and related lithographic effects in the low k(1) and ultrahigh numerical aperture regime Erdmann, A.; Evanschitzky, P.	Zeitschriftenaufsatz Journal Article
2007	Fast near field simulation of optical and EUV masks using the waveguide method Evanschitzky, P.; Erdmann, A.	Konferenzbeitrag Conference Paper
2007	The impact of the mask stack and its optical parameters on the imaging performance Erdmann, A.; Fühner, T.; Seifert, S.; Popp, S.; Evanschitzky, P.	Konferenzbeitrag Conference Paper
2007	Simulation of proximity and contact lithography Meliorisz, B.; Evanschitzky, P.; Erdmann, A.	Zeitschriftenaufsatz Journal Article
2007	Impact of alternative mask stacks on the imaging performance at NA 1.20 and above Philipsen, V.; Mesuda, K.; Bisschop, P. de; Erdmann, A.; Citarella, G.; Evanschitzky, P.; Birkner, R.; Richter, R.; Scherübl, T.	Konferenzbeitrag Conference Paper
2007	Simulation of larger mask areas using the waveguide method with fast decomposition technique Evanschitzky, P.; Shao, F.; Erdmann, A.; Reibold, D.	Konferenzbeitrag Conference Paper
2006	A fast development simulation algorithm for discrete resist models Schnattinger, T.; Bär, E.; Erdmann, A.	Konferenzbeitrag Conference Paper
2006	Rigorous mask modeling beyond the Hopkins approach Schermer, J.; Evanschitzky, P.; Erdmann, A.	Konferenzbeitrag Conference Paper
2006	Efficient optimization of lithographic process conditions using a distributed, combined global/local search approach Fühner, T.; Popp, S.; Dürr, C.; Erdmann, A.	Konferenzbeitrag Conference Paper
2006	Defect printability study using EUV lithography Holfeld, C.; Bubke, K.; Lehmann, F.; La Fontaine, B.; Pawloski, A.R.; Schwarzl, S.; Kamm, F.M.; Graf, T.; Erdmann, A.	Konferenzbeitrag Conference Paper
2006	Three-dimensional resist development simulation with discrete models Schnattinger, T.; Baer, E.; Erdmann, A.	Zeitschriftenaufsatz Journal Article
2006	Rigorous mask modeling using waveguide and FDTD methods. An assessment for typical hyper NA imaging problems Erdmann, A.; Evanschitzky, P.; Citarella, G.; Fühner, T.; Bisschop, P. de	Konferenzbeitrag Conference Paper
2006	Rigorous mask modelling beyond the hopkins approach Schermer, J.; Evanschitzky, P.; Erdmann, A.	Konferenzbeitrag Conference Paper
2006	Benchmark of a lithography simulation tool for next generation applications Tollkühn, B.; Uhle, M.; Fuhrmann, J.; Gärtner, K.; Heubner, A.; Erdmann, A.	Konferenzbeitrag Conference Paper
2006	Accurate extraction of maximum current densities from the layout Seidl, A.; Schnattinger, T.; Erdmann, A.; Hartmann, H.; Petrashenko, A.	Konferenzbeitrag Conference Paper
2006	Mesoscopic resist processing simulation in optical lithography Schnattinger, T.; Bär, E.; Erdmann, A.	Konferenzbeitrag Conference Paper
2006	Mask defect printing mechanisms for future lithography generations Erdmann, A.; Graf, T.; Bubke, K.; Höllein, I.; Teuber, S.	Konferenzbeitrag Conference Paper
2006	Validity of the Hopkins approximation in simulations of hyper-NA (NA>1) line-space structures for an attenuated PSM mask Erdmann, A.; Citarella, G.; Evanschitzky, P.; Schermer, H.; Philipsen, V.; Bisschop, P. de	Konferenzbeitrag Conference Paper
2005	Mask modeling in the low k(1) and ultrahigh NA regime: Phase and polarization effects Erdmann, A.	Konferenzbeitrag Conference Paper
2005	Simulation of the effect of a resist-surface bound air bubble on imaging in immersion lithography Bisschop, P. de; Erdmann, A.; Rathsfeld, A.	Konferenzbeitrag Conference Paper
2005	Mask modeling in the low k1 and ultrahigh NA regime: phase and polarization effects Erdmann, A.	Konferenzbeitrag Conference Paper
2005	Simplified resist models for efficient simulation of contact holes and line ends Tollkühn, B.; Erdmann, A.; Semmler, A.; Nölscher, C.	Konferenzbeitrag Conference Paper
2005	Three dimensional EUV simulations: a new mask near field and imaging simulation system Evanschitzky, P.; Erdmann, A.	Konferenzbeitrag Conference Paper
2005	Aerial image analysis for defective masks in optical lithography Graf, T.; Erdmann, A.; Evanschitzky, P.; Tollkühn, B.; Eggers, K.; Ziebold, R.; Teuber, S.; Höllein, I.	Konferenzbeitrag Conference Paper
2005	Correlation analysis: A fast and reliable method for a better understanding of simulation models in optical lithography Tollkühn, B.; Heubner, A.; Elian, K.; Ruppenstein, B.; Erdmann, A.	Konferenzbeitrag Conference Paper
2005	Mask and wafer topography effects in immersion lithography Erdmann, A.; Evanschitzky, P.; Bisschop, P. de	Konferenzbeitrag Conference Paper
2005	Improved mask and source representations for automatic optimization of lithographic process conditions using a genetic algorithm Fühner, T.; Erdmann, A.	Konferenzbeitrag Conference Paper
2005	Modeling and simulation Erdmann, A.	Aufsatz in Buch Book Article
2004	Towards automatic mask and source optimization for optical lithography Erdmann, A.; Fühner, T.; Schnattinger, T.; Tollkühn, B.	Konferenzbeitrag Conference Paper
2004	Verfahren zur Bestimmung von Strukturparametern einer Oberflaeche Weidner, A.; Erdmann, A.; Schneider, C.	Patent
2004	Process optimization using lithography simulation Erdmann, A.	Konferenzbeitrag Conference Paper
2004	Do we need complex resist models for predictive simulation of lithographic process performance? Tollkühn, B.; Erdmann, A.; Lammers, J.; Nolscher, C.; Semmler, A.	Konferenzbeitrag Conference Paper
2004	Genetic algorithms to improve mask and illumination geometries in lithographic imaging systems Fühner, T.; Erdmann, A.; Farkas, R.; Tollkühn, B.; Kokai, G.	Konferenzbeitrag Conference Paper
2004	Genetic algorithms for geometry optimization in lithographic imaging systems Fühner, T.; Erdmann, A.; Schnattinger, T.	Konferenzbeitrag Conference Paper
2004	Enhanced model for the efficient 2D and 3D simulation of defective EUV masks Evanschitzky, P.; Erdmann, A.	Konferenzbeitrag Conference Paper
2004	The impact of EUV mask defects on lithographic process performance Evanschitzky, P.; Erdmann, A.	Konferenzbeitrag Conference Paper
2004	Simulation is essential to successful design of modern semiconductors Erdmann, A.	Zeitschriftenaufsatz Journal Article
2004	Genetic algorithm for optimization and calibration in process simulation Fühner, T.; Erdmann, A.; Ortiz, C.J.; Lorenz, J.	Konferenzbeitrag Conference Paper
2003	Rigorous simulation of exposure over nonplanar wafers Erdmann, A.; Kalus, C.K.; Schmöller, T.; Klyonova, Y.; Sato, T.; Endo, A.; Shibata, T.; Kobayashi, Y.	Konferenzbeitrag Conference Paper
2003	Will Darwin's law help us to improve our resist models? Tollkühn, B.; Fühner, T.; Matiut, D.; Erdmann, A.; Semmler, A.; Kuchler, B.; Kokai, B.	Konferenzbeitrag Conference Paper
2003	Simulation of extreme ultraviolet masks with defective multilayers Evanschitzky, P.; Erdmann, A.; Besacier, M.; Schiavone, P.	Konferenzbeitrag Conference Paper
2003	Optical lithography for future technology generations Erdmann, A.	Zeitschriftenaufsatz Journal Article
2003	EUV mask simulation for AIMS Windpassinger, R.; Rosenkranz, N.; Scherübl, T.; Evanschitzky, P.; Erdmann, A.; Zibold, A.	Konferenzbeitrag Conference Paper
2003	Efficient simulation of light diffraction from 3-dimensional EUV-masks using field decomposition techniques Erdmann, A.; Kalus, C.K.; Schmöller, T.; Wolter, A.	Konferenzbeitrag Conference Paper
2003	New models for the simulation of post-exposure bake of chemically amplified resist Matiut, D.; Erdmann, A.; Tollkühn, B.; Semmler, A.	Konferenzbeitrag Conference Paper
2003	Rigorous simulation of defective EUV multilayer masks Sambale, C.; Schmöller, T.; Erdmann, A.; Evanschitzky, P.; Kalus, C.	Konferenzbeitrag Conference Paper
2003	Rigorous simulation of alignment for microlithography Nikolaev, N.I.; Erdmann, A.	Zeitschriftenaufsatz Journal Article
2003	Mask and source optimization for lithographic imaging systems Erdmann, A.; Farkas, R.; Fühner, T.; Tollkühn, B.; Kokai, G.	Konferenzbeitrag Conference Paper
2002	New methods to calibrate simulation parameters for chemically amplified resists Tollkuehn, B.; Erdmann, A.; Kivel, N.; Robertson, S.A.; Kang, D.; Hansen, S.G.; Fumar, P.A.; Tsann, B.C.; Hoppe, W.	Konferenzbeitrag Conference Paper
2002	Enhancements in rigorous simulation of light diffraction from phase-shift masks Erdmann, A.; Kachwala, N.	Konferenzbeitrag Conference Paper
2002	Modification of boundaries conditions in the FDTD algorithm for EUV masks modeling Vial, A.; Erdmann, A.; Schmoeller, T.; Kalus, C.	Konferenzbeitrag Conference Paper
2002	Herstellung von optisch abgebildeten Strukturen mit einer Phasenschiebung von transmittierten Lichtanteilen Erdmann, A.; Vial, A.	Patent
2001	Effect of copper on the breakthrough voltage of Poly-Si - Poly-Si capacitors Boehringer, M.; Pillion, J.E.; Erdmann, V.; Rygula, M.; Winz, K.; Brauchle, P.; Aquino, D.; Zhang, H.; Zahka, J.; Zielonka, G.; Hauber, J.	Konferenzbeitrag Conference Paper
2001	Automatic resist parameter calibration procedure for lithography simulation Tollkuehn, B.; Hoepfl, M.; Erdmann, A.; Majoni, S.; Jess, M.	Konferenzbeitrag Conference Paper
2001	Benchmarking of available rigorous electromagnetic field (EMF) simulators for phase-shift mask applications Kalus, C.; List, S.; Erdmann, A.; Gordon, R.; McCallum, M.; Semmler, A.	Zeitschriftenaufsatz Journal Article
2001	Optical simulation of 3D Mask effects Rosenbusch, A.; Erdmann, A.; Friedrich, C.	Zeitschriftenaufsatz Journal Article
2001	Trace analysis for 300 mm wafers and processes with total- reflection x-ray-fluorescence Nutsch, A.; Erdmann, V.; Zielonka, G.; Pfitzner, L.; Ryssel, H.	Zeitschriftenaufsatz Journal Article
2001	3D-electromagnetic field simulation for Low-k1 lithography applications Erdmann, A.; Gordon, R.; McCallum, M.; Rosenbusch, A.	Zeitschriftenaufsatz Journal Article
2001	The impact of exposure induced refractive index changes of photoresists on the photolithographic process Erdmann, A.; Henderson, C.L.; Willson, C.G.	Zeitschriftenaufsatz Journal Article
2001	Topography effects and wave aberrations in advanced PSM technology Erdmann, A.	Konferenzbeitrag Conference Paper
2001	Comparison of simulation approaches for chemically amplified resists Erdmann, A.; Henke, W.; Robertson, S.; Richter, E.; Tollkühn, B.; Hoppe, W.	Konferenzbeitrag Conference Paper
2000	Rigorous diffraction analysis for future mask technology Erdmann, A.; Friedrich, C.	Konferenzbeitrag Conference Paper

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