Publications Computational Lithography and Optics

Jahr Year	Titel/Autor:in Title/Author	Publikationstyp Publication Type
2011	Modellierung und Simulation bei Mask Aligner Lithographie (Source-Mask Optimization) Vogler, U.; Bramati, A.; Völkel, R.; Hornung, M.; Zoberbier, R.; Motzek, M.; Erdmann, A.; Stürzebecher, L.; Zeitner, U.	Zeitschriftenaufsatz Journal Article
2010	Efficient simulation of three-dimensional EUV masks for rigorous source mask optimization and mask induced imaging artifact analysis Evanschitzky, P.; Fühner, T.; Shao, F.; Erdmann, A.	Konferenzbeitrag Conference Paper
2010	Optimization of illumination pupils and mask structures for proximity printing Motzek, K.; Bich, A.; Erdmann, A.; Hornung, M.; Hennemeyer, M.; Meliorisz, B.; Hofmann, U.; Ünal, N.; Völkel, R.; Partel, S.; Hudek, P.	Konferenzbeitrag Conference Paper
2010	Topography-aware BARC optimization for double patterning Liu, S.; Fühner, T.; Shao, F.; Barenbaum, A.; Jahn, J.; Erdmann, A.	Konferenzbeitrag Conference Paper
2010	Rigorous EMF simulation of absorber shape variations and their impact on lithographic processes Rahimi, Z.; Erdmann, A.; Evanschitzky, P.; Pflaum, C.	Konferenzbeitrag Conference Paper
2010	Characterization of the scattering effect of complex mask geometries with surface roughness Rahimi, Z.; Erdmann, A.; Pflaum, C.	Konferenzbeitrag Conference Paper
2010	Mask diffraction analysis and optimization for extreme ultraviolet masks Erdmann, A.; Evanschitzky, P.; Fühner, T.	Zeitschriftenaufsatz Journal Article
2010	Modeling of exploration of reversible contrast enhacement layers for double exposure lithography Shao, F.; Cooper, G.D.; Chen, Z.; Erdmann, A.	Konferenzbeitrag Conference Paper
2010	Modeling of double patterning interactions in litho-cure-litho-etch (LCLE) processes Erdmann, A.; Shao, F.; Fuhrmann, J.; Fiebach, A.; Patsis, G.P.; Trefonas, P.	Konferenzbeitrag Conference Paper
2010	Acid diffusion effects between resists in freezing processes used for contact hole patterning Fuhrmann, J.; Fiebach, A.; Erdmann, A.; Trefonas, P.	Konferenzbeitrag Conference Paper
2010	Extraordinary low transmission of a metamaterial for application in lithography Dobmann, S.; Ploss, D.; Reibold, D.; Erdmann, A.; Peschel, U.	Konferenzbeitrag Conference Paper
2010	Fast and highly accurate simulation of the printing behavior of EUV multilayer defects based on different models Shao, F.; Evanschitzky, P.; Motzek, K.; Erdmann, A.	Konferenzbeitrag Conference Paper
2010	Mask and wafer topography effects in optical and EUV-lithography Erdmann, A.; Shao, F.; Evanschitzky, P.; Fühner, T.	Konferenzbeitrag Conference Paper
2010	Mask-topography-induced phase effects and wave aberrations in optical and extreme ultraviolet lithography Erdmann, A.; Shao, F.; Evanschitzky, P.; Fühner, T.	Konferenzbeitrag Conference Paper
2009	Extraordinary low transmission effects for ultra-thin patterned metal films Reibold, D.; Shao, F.; Erdmann, A.; Peschel, U.	Zeitschriftenaufsatz Journal Article
2009	Rigorous diffraction simulations of topographic wafer stacks in double patterning Feng, S.; Evanschitzky, P.; Fühner, T.; Erdmann, A.	Konferenzbeitrag Conference Paper
2009	A model of self-limiting residual acid diffusion for pattern doubling Fuhrmann, J.; Fiebach, A.; Uhle, M.; Erdmann, A.; Szmanda, C.R.; Truong, C.	Konferenzbeitrag Conference Paper
2009	Lithography simulation: Modeling techniques and selected applications Erdmann, A.; Fühner, T.; Shao, F.; Evanschitzky, P.	Konferenzbeitrag Conference Paper
2009	Lithographic importance of base diffusion in chemically amplified photoresists Schnattinger, T.; Erdmann, A.	Konferenzbeitrag Conference Paper
2009	Efficient simulation and optimization of wafer topographies in double patterning Shao, F.; Evanschitzky, P.; Fühner, T.; Erdmann, A.	Konferenzbeitrag Conference Paper
2009	Extended Abbe approach for fast and accurate lithography imaging simulations Evanschitzky, P.; Erdmann, A.; Fühner, T.	Konferenzbeitrag Conference Paper
2009	Finite Integration (FI) method for modelling optical waves in lithography masks Rahimi, Z.; Erdmann, A.; Pflaum, C.	Konferenzbeitrag Conference Paper
2009	Advanced lithography models for strict process control in the 32 nm technology node Patsis, G.P.; Drygiannakis, D.; Raptis, I.; Gogolides, E.; Erdmann, A.	Konferenzbeitrag Conference Paper
2009	Efficient analysis of three dimensional EUV mask imaging artifacts using the waveguide decomposition method Shao, F.; Evanschitzky, P.; Fühner, T.; Erdmann, A.	Konferenzbeitrag Conference Paper
2009	Mask diffraction analysis and optimization for EUV masks Erdmann, A.; Evanschitzky, P.; Fühner, T.	Konferenzbeitrag Conference Paper
2009	Exploration of linear and non-linear double exposure techniques by simulation Petersen, J.S.; Greenway, R.T.; Fühner, T.; Evanschitzky, P.; Shao, F.; Erdmann, A.	Konferenzbeitrag Conference Paper
2009	Photomasks for semiconductor lithography: From simple shadow casters to complex 3D scattering objects Erdmann, A.; Reibold, D.; Fühner, T.; Evanschitzky, P.	Konferenzbeitrag Conference Paper
2008	A simulation study on the impact of lithographic process variations on CMOS device performance Fühner, T.; Kampen, C.; Kodrasi, I.; Burenkov, A.; Erdmann, A.	Konferenzbeitrag Conference Paper
2008	Photomasks for semiconductor lithography: From simple shadow casters to complex 3D scattering objects Erdmann, A.; Reibold, D.; Fühner, T.; Evanschitzky, P.	Konferenzbeitrag Conference Paper
2008	On the stability of fully depleted SOI MOSFETs under lithography process variations Kampen, C.; Fühner, T.; Burenkov, A.; Erdmann, A.; Lorenz, J.; Ryssel, H.	Konferenzbeitrag Conference Paper
2008	Optimization of mask absorber stacks and illumination settings for contact hole imaging Erdmann, A.; Fühner, T.; Evanschitzky, P.	Konferenzbeitrag Conference Paper
2008	Fast rigorous simulation of mask diffraction using the waveguide method with parallelized decomposition technique Shao, F.; Evanschitzky, P.; Reibold, D.; Erdmann, A.	Konferenzbeitrag Conference Paper
2008	Investigation of high-resolution contact printing Meliorisz, B.; Partel, S.; Schnattinger, T.; Fühner, T.; Erdmann, A.; Hudek, P.	Konferenzbeitrag Conference Paper
2008	A comprehensive resist model for the prediction of line-edge roughness material and process dependencies in optical lithography Schnattinger, T.; Erdmann, A.	Konferenzbeitrag Conference Paper
2008	Increasing the predictability of AIMSTM measurements by coupling to resist simulations Meliorisz, B.; Erdmann, A.; Schnattinger, T.; Strößner, U.; Scherübl, T.; Bisschop, P. de; Philipsen, V.	Konferenzbeitrag Conference Paper
2008	Rigorous electromagnetic field simulation of two-beam interference exposures for the exploration of double patterning and double exposure scenarios Erdmann, A.; Evanschitzky, P.; Fühner, T.; Schnattinger, T.; Xu, C.B.; Szmanda, C.	Konferenzbeitrag Conference Paper
2008	Simulation-based EUV source and mask optimization Fühner, T.; Erdmann, A.; Evanschitzky, P.	Konferenzbeitrag Conference Paper
2008	Benchmark of rigorous methods for electromagnetic field simulations Burger, S.; Zschiedrich, L.; Schmidt, F.; Evanschitzky, P.; Erdmann, A.	Konferenzbeitrag Conference Paper
2007	Dr.LiTHO - a development and research lithography simulator Fühner, T.; Schnattinger, T.; Ardelean, G.; Erdmann, A.	Konferenzbeitrag Conference Paper
2007	Memetic algorithms: Parametric optimization for microlithography Dürr, C.; Fühner, T.; Tollkühn, B.; Erdmann, A.; Kokai, G.	Aufsatz in Buch Book Article
2007	Simulation of mask proximity printing Meliorisz, B.; Erdmann, A.	Zeitschriftenaufsatz Journal Article
2007	The impact of the mask stack and its optical parameters on the imaging performance Erdmann, A.; Fühner, T.; Seifert, S.; Popp, S.; Evanschitzky, P.	Konferenzbeitrag Conference Paper
2007	Rigorous electromagnetic field mask modeling and related lithographic effects in the low k(1) and ultrahigh numerical aperture regime Erdmann, A.; Evanschitzky, P.	Zeitschriftenaufsatz Journal Article
2007	Fast near field simulation of optical and EUV masks using the waveguide method Evanschitzky, P.; Erdmann, A.	Konferenzbeitrag Conference Paper
2007	Direct optimization approach for lithographic process conditions Fühner, T.; Erdmann, A.; Seifert, S.	Zeitschriftenaufsatz Journal Article
2007	Simulation of proximity and contact lithography Meliorisz, B.; Evanschitzky, P.; Erdmann, A.	Zeitschriftenaufsatz Journal Article
2007	Impact of alternative mask stacks on the imaging performance at NA 1.20 and above Philipsen, V.; Mesuda, K.; Bisschop, P. de; Erdmann, A.; Citarella, G.; Evanschitzky, P.; Birkner, R.; Richter, R.; Scherübl, T.	Konferenzbeitrag Conference Paper
2007	Simulation of larger mask areas using the waveguide method with fast decomposition technique Evanschitzky, P.; Shao, F.; Erdmann, A.; Reibold, D.	Konferenzbeitrag Conference Paper
2006	Benchmark of a lithography simulation tool for next generation applications Tollkühn, B.; Uhle, M.; Fuhrmann, J.; Gärtner, K.; Heubner, A.; Erdmann, A.	Konferenzbeitrag Conference Paper
2006	Efficient optimization of lithographic process conditions using a distributed, combined global/local search approach Fühner, T.; Popp, S.; Dürr, C.; Erdmann, A.	Konferenzbeitrag Conference Paper
2006	A fast development simulation algorithm for discrete resist models Schnattinger, T.; Bär, E.; Erdmann, A.	Konferenzbeitrag Conference Paper
2006	Rigorous mask modeling beyond the Hopkins approach Schermer, J.; Evanschitzky, P.; Erdmann, A.	Konferenzbeitrag Conference Paper
2006	Rigorous mask modelling beyond the hopkins approach Schermer, J.; Evanschitzky, P.; Erdmann, A.	Konferenzbeitrag Conference Paper
2006	Mask defect printing mechanisms for future lithography generations Erdmann, A.; Graf, T.; Bubke, K.; Höllein, I.; Teuber, S.	Konferenzbeitrag Conference Paper
2006	Accurate extraction of maximum current densities from the layout Seidl, A.; Schnattinger, T.; Erdmann, A.; Hartmann, H.; Petrashenko, A.	Konferenzbeitrag Conference Paper
2006	Three-dimensional resist development simulation with discrete models Schnattinger, T.; Baer, E.; Erdmann, A.	Zeitschriftenaufsatz Journal Article
2006	Defect printability study using EUV lithography Holfeld, C.; Bubke, K.; Lehmann, F.; La Fontaine, B.; Pawloski, A.R.; Schwarzl, S.; Kamm, F.M.; Graf, T.; Erdmann, A.	Konferenzbeitrag Conference Paper
2006	Mesoscopic resist processing simulation in optical lithography Schnattinger, T.; Bär, E.; Erdmann, A.	Konferenzbeitrag Conference Paper
2006	Validity of the Hopkins approximation in simulations of hyper-NA (NA>1) line-space structures for an attenuated PSM mask Erdmann, A.; Citarella, G.; Evanschitzky, P.; Schermer, H.; Philipsen, V.; Bisschop, P. de	Konferenzbeitrag Conference Paper
2006	Rigorous mask modeling using waveguide and FDTD methods. An assessment for typical hyper NA imaging problems Erdmann, A.; Evanschitzky, P.; Citarella, G.; Fühner, T.; Bisschop, P. de	Konferenzbeitrag Conference Paper
2005	Simulation of the effect of a resist-surface bound air bubble on imaging in immersion lithography Bisschop, P. de; Erdmann, A.; Rathsfeld, A.	Konferenzbeitrag Conference Paper
2005	Mask modeling in the low k1 and ultrahigh NA regime: phase and polarization effects Erdmann, A.	Konferenzbeitrag Conference Paper
2005	Improved mask and source representations for automatic optimization of lithographic process conditions using a genetic algorithm Fühner, T.; Erdmann, A.	Konferenzbeitrag Conference Paper
2005	Mask modeling in the low k(1) and ultrahigh NA regime: Phase and polarization effects Erdmann, A.	Konferenzbeitrag Conference Paper
2005	Three dimensional EUV simulations: a new mask near field and imaging simulation system Evanschitzky, P.; Erdmann, A.	Konferenzbeitrag Conference Paper
2005	Correlation analysis: A fast and reliable method for a better understanding of simulation models in optical lithography Tollkühn, B.; Heubner, A.; Elian, K.; Ruppenstein, B.; Erdmann, A.	Konferenzbeitrag Conference Paper
2005	Mask and wafer topography effects in immersion lithography Erdmann, A.; Evanschitzky, P.; Bisschop, P. de	Konferenzbeitrag Conference Paper
2005	Simplified resist models for efficient simulation of contact holes and line ends Tollkühn, B.; Erdmann, A.; Semmler, A.; Nölscher, C.	Konferenzbeitrag Conference Paper
2005	Modeling and simulation Erdmann, A.	Aufsatz in Buch Book Article
2005	Aerial image analysis for defective masks in optical lithography Graf, T.; Erdmann, A.; Evanschitzky, P.; Tollkühn, B.; Eggers, K.; Ziebold, R.; Teuber, S.; Höllein, I.	Konferenzbeitrag Conference Paper
2004	Verfahren zur Bestimmung von Strukturparametern einer Oberflaeche Weidner, A.; Erdmann, A.; Schneider, C.	Patent
2004	Towards automatic mask and source optimization for optical lithography Erdmann, A.; Fühner, T.; Schnattinger, T.; Tollkühn, B.	Konferenzbeitrag Conference Paper
2004	Do we need complex resist models for predictive simulation of lithographic process performance? Tollkühn, B.; Erdmann, A.; Lammers, J.; Nolscher, C.; Semmler, A.	Konferenzbeitrag Conference Paper
2004	Process optimization using lithography simulation Erdmann, A.	Konferenzbeitrag Conference Paper
2004	Genetic algorithms to improve mask and illumination geometries in lithographic imaging systems Fühner, T.; Erdmann, A.; Farkas, R.; Tollkühn, B.; Kokai, G.	Konferenzbeitrag Conference Paper
2004	Genetic algorithms for geometry optimization in lithographic imaging systems Fühner, T.; Erdmann, A.; Schnattinger, T.	Konferenzbeitrag Conference Paper
2004	Enhanced model for the efficient 2D and 3D simulation of defective EUV masks Evanschitzky, P.; Erdmann, A.	Konferenzbeitrag Conference Paper
2004	Simulation is essential to successful design of modern semiconductors Erdmann, A.	Zeitschriftenaufsatz Journal Article
2004	Genetic algorithm for optimization and calibration in process simulation Fühner, T.; Erdmann, A.; Ortiz, C.J.; Lorenz, J.	Konferenzbeitrag Conference Paper
2004	The impact of EUV mask defects on lithographic process performance Evanschitzky, P.; Erdmann, A.	Konferenzbeitrag Conference Paper
2003	Simulation of extreme ultraviolet masks with defective multilayers Evanschitzky, P.; Erdmann, A.; Besacier, M.; Schiavone, P.	Konferenzbeitrag Conference Paper
2003	Optical lithography for future technology generations Erdmann, A.	Zeitschriftenaufsatz Journal Article
2003	EUV mask simulation for AIMS Windpassinger, R.; Rosenkranz, N.; Scherübl, T.; Evanschitzky, P.; Erdmann, A.; Zibold, A.	Konferenzbeitrag Conference Paper
2003	Mask and source optimization for lithographic imaging systems Erdmann, A.; Farkas, R.; Fühner, T.; Tollkühn, B.; Kokai, G.	Konferenzbeitrag Conference Paper
2003	Will Darwin's law help us to improve our resist models? Tollkühn, B.; Fühner, T.; Matiut, D.; Erdmann, A.; Semmler, A.; Kuchler, B.; Kokai, B.	Konferenzbeitrag Conference Paper
2003	Rigorous simulation of exposure over nonplanar wafers Erdmann, A.; Kalus, C.K.; Schmöller, T.; Klyonova, Y.; Sato, T.; Endo, A.; Shibata, T.; Kobayashi, Y.	Konferenzbeitrag Conference Paper
2003	Efficient simulation of light diffraction from 3-dimensional EUV-masks using field decomposition techniques Erdmann, A.; Kalus, C.K.; Schmöller, T.; Wolter, A.	Konferenzbeitrag Conference Paper
2003	Rigorous simulation of alignment for microlithography Nikolaev, N.I.; Erdmann, A.	Zeitschriftenaufsatz Journal Article
2003	Rigorous simulation of defective EUV multilayer masks Sambale, C.; Schmöller, T.; Erdmann, A.; Evanschitzky, P.; Kalus, C.	Konferenzbeitrag Conference Paper
2003	New models for the simulation of post-exposure bake of chemically amplified resist Matiut, D.; Erdmann, A.; Tollkühn, B.; Semmler, A.	Konferenzbeitrag Conference Paper
2002	New methods to calibrate simulation parameters for chemically amplified resists Tollkuehn, B.; Erdmann, A.; Kivel, N.; Robertson, S.A.; Kang, D.; Hansen, S.G.; Fumar, P.A.; Tsann, B.C.; Hoppe, W.	Konferenzbeitrag Conference Paper
2002	Herstellung von optisch abgebildeten Strukturen mit einer Phasenschiebung von transmittierten Lichtanteilen Erdmann, A.; Vial, A.	Patent
2002	Enhancements in rigorous simulation of light diffraction from phase-shift masks Erdmann, A.; Kachwala, N.	Konferenzbeitrag Conference Paper
2002	Modification of boundaries conditions in the FDTD algorithm for EUV masks modeling Vial, A.; Erdmann, A.; Schmoeller, T.; Kalus, C.	Konferenzbeitrag Conference Paper
2001	Effect of copper on the breakthrough voltage of Poly-Si - Poly-Si capacitors Boehringer, M.; Pillion, J.E.; Erdmann, V.; Rygula, M.; Winz, K.; Brauchle, P.; Aquino, D.; Zhang, H.; Zahka, J.; Zielonka, G.; Hauber, J.	Konferenzbeitrag Conference Paper
2001	Benchmarking of available rigorous electromagnetic field (EMF) simulators for phase-shift mask applications Kalus, C.; List, S.; Erdmann, A.; Gordon, R.; McCallum, M.; Semmler, A.	Zeitschriftenaufsatz Journal Article
2001	Topography effects and wave aberrations in advanced PSM technology Erdmann, A.	Konferenzbeitrag Conference Paper
2001	Optical simulation of 3D Mask effects Rosenbusch, A.; Erdmann, A.; Friedrich, C.	Zeitschriftenaufsatz Journal Article
2001	Trace analysis for 300 mm wafers and processes with total- reflection x-ray-fluorescence Nutsch, A.; Erdmann, V.; Zielonka, G.; Pfitzner, L.; Ryssel, H.	Zeitschriftenaufsatz Journal Article
2001	The impact of exposure induced refractive index changes of photoresists on the photolithographic process Erdmann, A.; Henderson, C.L.; Willson, C.G.	Zeitschriftenaufsatz Journal Article

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