Fraunhofer IISB, Erlangen, Germany
                            Schottkystr. 10, 91058 Erlangen
                    
December 03, 2025, 09:00 h - 16:00 h
Fraunhofer IISB
Sputter deposition of dielectric films for photonics, MEMS and power electronics using the Double Ring Magnetron
 Hagen Bartzsch, Fraunhofer FEP, Dresden
VECTOR Express Pulsed Plasma SiN for GaN Application
 Michael Woitge, LAM Research, Dresden
Vorläufiger Titel: SiC Trench Etch
 Franz Bosl, KLA, Dresden
Semiconducting Thin Film Deposition via Rotary Disc Magnetron Sputtering
 I Made Wahyu Diyatmika, VON ARDENNE, Dresden
Vorläufiger Titel: Wafersticking auf TEL Vigus
 Sebastian Oehler, Infineon, Dresden 
PFAS and GHG - Possible Substitutions and new Developments for Plasma-Etch and PECVD
 Robert Wieland, Wieland Process Consulting, München
Vorläufiger Titel: Green/Sustainable manufacturing 
 Christopher Lange, Fraunhofer IISB, Erlangen
Vorläufiger Titel: Nano coatings with Openair-Plasma
 Nico Coenen, Plasmatreat GmbH, Steinhagen
PASCALO In-Line Bow & Stress Metrology on Sigma fxP Systems for AlScN  & other Applications
 Scott Haymore (Product R&D Eng.), KLA, Newport