41st Mask and Lithography Conference EMLC 2026

The annual EMLC brings together scientists, researchers, engineers, and technicians from research institutes and companies worldwide. It showcases the latest findings in mask and lithography technologies and is devoted to research, technology, and related processes. The conference provides an overview of the current state of mask and lithography technologies as well as future strategies. Within this platform, researchers and practitioners have the opportunity to acquaint themselves with the latest developments, review results, and engage in constructive discussions with colleagues from diverse companies and research institutions.

The EMLC Program Chairs are H. Loeschner (IMS Nanofabrication), G. Bottiglieri (ASML), A. Erdmann (Fraunhofer IISB), and J. H. Peters (bmbg consult).

The following presentation reports on research results from Fraunhofer IISB:

Monday, June 22, 16:30 to 16:50 h
Simulation Model for Maskless Lithography Based on Digital Mirror Devices
by F. Benavides, A. Erdmann, M. Nagel, S. Degel
 

We are looking forward to seeing you in Jena!