Publications Thin Film Devices and Systems

Jahr Year	Titel/Autor:in Title/Author	Publikationstyp Publication Type
2024	Adhesion strength of ductile thin film determined by cross-sectional nanoindentation Zhao, Dawei; Letz, Sebastian; Jank, Michael; März, Martin	Zeitschriftenaufsatz Journal Article
2023	Intragranular thermal fatigue of Cu thin films: Near-grain boundary hardening, strain localization and voiding Hlushko, K.; Ziegelwanger, T.; Reisinger, M.; Todt, J.; Meindlhumer, M.; Beuer, Susanne; Rommel, Mathias; Greving, I.; Flenner, S.; Kopeček, J.; Keckes, J.; Detlefs, C.; Yildirim, C.	Zeitschriftenaufsatz Journal Article
2023	Tailoring the Acidity of Liquid Media with Ionizing Radiation: Rethinking the Acid-Base Correlation beyond pH Fritsch, Birk; Körner, Andreas; Couasnon, Thaïs; Blukis, Roberts; Taherkhani, Mehran; Benning, Liane G.; Jank, Michael; Spiecker, Erdmann; Hutzler, Andreas	Zeitschriftenaufsatz Journal Article
2022	Ultrathin and flexible sensors for pressure and temperature monitoring inside battery cells Dreher, Vincent; Joch, Daniel; Kren, Harald; Schwarberg, Jannik H.; Jank, Michael P.M.	Konferenzbeitrag Conference Paper
2022	Sub-Kelvin thermometry for evaluating the local temperature stability within in situ TEM gas cells Fritsch, Birk; Wu, Mingjian; Hutzler, Andreas; Zhou, Dan; Spruit, Ronald; Vogl, Lilian; Will, Johannes; Perez Garza, H. Hugo; März, Martin; Jank, Michael; Spiecker, Erdmann	Zeitschriftenaufsatz Journal Article
2022	Low-Temperature and UV Irradiation Effect on Transformation of Zirconia -MPS nBBs-Based Gels into Hybrid Transparent Dielectric Thin Films Musat, V.; Herbei, E.E.; Anghel, E.M.; Jank, Michael; Oertel, Susanne; Timpu, D.; Frangu, L.	Zeitschriftenaufsatz Journal Article
2021	From Cyclopentasilane to Thin-Film Transistors Gerwig, M.; Ali, A.S.; Neubert, D.; Polster, S.; Bohme, U.; Franze, G.; Rosenkranz, M.; Popov, A.; Ponomarev, I.; Jank, M.; Vieweger, C.; Brendler, E.; Frey, L.; Kroll, P.; Kroke, E.	Zeitschriftenaufsatz Journal Article
2021	A Fully Integrated Ferroelectric Thin-Film-Transistor - Influence of Device Scaling on Threshold Voltage Compensation in Displays Lehninger, D.; Ellinger, M.; Ali, T.; Li, S.; Mertens, K.; Lederer, M.; Olivio, R.; Kampfe, T.; Hanisch, N.; Biedermann, K.; Rudolph, M.; Brackmann, V.; Sanctis, C.; Jank, M.; Seidel, K.	Zeitschriftenaufsatz Journal Article
2020	Combined experimental and numerical approach for investigating the mechanical degradation of the interface between thin film metallization and Si-substrate after temperature cycling test Zhao, Dawei; Letz, Sebastian; Yu, Zechun; Schletz, Andreas; März, Martin	Zeitschriftenaufsatz Journal Article
2020	Reducing On-Resistance for SiC Diodes by Thin Wafer and Laser Anneal Technology Rusch, Oleg; Hellinger, Carsten; Moult, Jonathan; Corcoran, Yunji; Erlbacher, Tobias	Konferenzbeitrag Conference Paper
2020	A Method for the Characterization of Adhesion Strength Degradation of Thin Films on Si-Substrate under Thermal Cycling Test Zhao, Dawei; Letz, Sebastian; Schletz, Andreas; März, Martin	Konferenzbeitrag Conference Paper
2019	Reducing On-Resistance for SiC Diodes by Thin Wafer and Laser Anneal Technology Rusch, O.; Hellinger, C.; Moult, J.; Corcoran, Y.; Erlbacher, T.	Poster
2018	Flexible thin film bending sensor based on Bragg gratings in hybrid polymers Girschikofsky, Maiko; Rosenberger, Manuel; Förthner, Michael; Rommel, Mathias; Frey, Lothar; Hellmann, Ralf	Konferenzbeitrag Conference Paper
2017	Generalized approach to design multi-layer stacks for enhanced optical detectability of ultrathin layers Hutzler, Andreas; Matthus, Christian D.; Rommel, Mathias; Frey, Lothar	Zeitschriftenaufsatz Journal Article
2016	Correlation of film morphology and defect content with the charge-carrier transport in thin-film transistors based on ZnO nanoparticles Polster, S.; Jank, M.P.M.; Frey, L.	Zeitschriftenaufsatz Journal Article
2016	Ion implantation of polypropylene films for the manufacture of thin film capacitors Häublein, V.; Birnbaum, E.; Ryssel, H.; Frey, L.; Djupmyr, M.	Konferenzbeitrag Conference Paper
2016	Materials integration for printed zinc oxide thin-film transistors: Engineering of a fully-printed semiconductor/contact scheme Liu, X.; Wegener, M.; Polster, S.; Jank, M.P.M.; Roosen, A.; Frey, L.	Zeitschriftenaufsatz Journal Article
2016	Contamination control for wafer container used within 300 mm manufacturing for power microelectronics Schneider, G.; Nguyen, T.Q.; Taubert, M.; Bounouar, J.; Le-Guet, C.; Leibold, A.; Richter, H.; Pfeffer, M.	Konferenzbeitrag Conference Paper
2015	Thin film metallization of PDMS with improved adhesion properties for micro electrode arrays Scharin, Marina; Newcomer, Kate; Dirnecker, Tobias; Al-Naimi, A.; Rumler, Maximilian; Rommel, Mathias; Frey, Lothar	Poster
2015	In situ formation of tantalum oxide - PMMA hybrid dielectric thin films for transparent electronic application Valcu, E.E.; Musat, V.; Oertel, S.; Jank, M.P.M.; Leedham, T.	Zeitschriftenaufsatz Journal Article
2015	Thin film metallization of PDMS with improved adhesion properties for micro electrode arrays Scharin, Marina; Newcomer, Kate; Al-Naimi, Abd; Dirnecker, Tobias; Rumler, Maximilian; Rommel, Mathias; Frey, Lothar	Poster
2014	Sol-gel preparation of ZrO2-PMMA for thin films transistors Valcu, E.E.; Musat, V.; Jank, M.; Oertel, S.	Zeitschriftenaufsatz Journal Article
2014	Optical characterization of patterned thin films Rosu, D.; Petrik, P.; Rattmann, G.; Schellenberger, M.; Beck, U.; Hertwig, A.	Zeitschriftenaufsatz Journal Article
2014	High-mobility metal-oxide thin-film transistors by spray deposition of environmentally friendly precursors Oertel, S.; Jank, M.P.M.; Teuber, E.; Bauer, A.J.; Frey, L.	Konferenzbeitrag Conference Paper
2014	Modification of polypropylene films for thin film capacitors by ion implantation Häublein, V.; Birnbaum, E.; Ryssel, H.; Frey, L.; Grimm, W.	Konferenzbeitrag Conference Paper
2014	Bioactivation of plane and patterned PDMS thin films by wettability engineering Scharin, Marina; Rommel, Mathias; Dirnecker, Tobias; Marhenke, Julius; Herrmann, Benjamin; Rumler, Maximilian; Fader, Robert; Frey, Lothar; Herrmann, Martin	Zeitschriftenaufsatz Journal Article
2013	In situ ATR monitoring of cross-link and diffusion behavior of thin-film epoxy and sol-gel based imprint resists Verschuuren, Marc; Fader, Robert; Brakel, Remco van; Hurxkens, Gert-Jan	Poster
2013	Surface modification of flexible plain and microstructured hard and soft PDMS-thin films by plasma treatment and layer deposition for improved usability for biomedical applications Scharin, Marina; Rommel, Mathias; Dirnecker, Tobias; Rumler, Maximilian; Fader, Robert; Bauer, A.J.; Frey, Lothar; Hermman, Martin	Poster
2013	Comparative measurements on atomic layer deposited Al2O3 thin films using ex situ table top and mapping ellipsometry, as well as X-ray and VUV reflectometry Petrik, P.; Gumprecht, T.; Nutsch, A.; Roeder, G.; Lemberger, M.; Juhasz, G.; Polgar, O.; Major, C.; Kozma, P.; Janosov, M.; Fodor, B.; Agocs, E.; Fried, M.	Zeitschriftenaufsatz Journal Article
2013	Laser melting of nanoparticulate transparent conductive oxide thin films Baum, M.; Polster, S.; Jank, M.P.M.; Alexeev, I.; Frey, L.; Schmidt, M.	Zeitschriftenaufsatz Journal Article
2013	Complementary methodologies for thin film characterization in one tool - A novel instrument for 450 mm wafers Holfelder, I.; Beckhoff, B.; Fliegauf, R.; Honicke, P.; Nutsch, A.; Petrik, P.; Roeder, G.; Weser, J.	Zeitschriftenaufsatz Journal Article
2013	Characterization of thin ZnO films by vacuum ultra-violet reflectometry Gumprecht, T.; Petrik, P.; Roeder, G.; Schellenberger, M.; Pfitzner, L.; Pollakowski, B.; Beckhoff, B.	Konferenzbeitrag Conference Paper
2012	Efficient laser induced consolidation of nanoparticulate ZnO thin films with reduced thermal budget Baum, M.; Polster, S.; Jank, M.P.M.; Alexeev, I.; Frey, L.; Schmidt, M.	Zeitschriftenaufsatz Journal Article
2012	Measurement strategy for dielectric ultra-thin film characterization by vacuum ultra-violet reflectometry Gumprecht, T.; Roeder, G.; Schellenberger, M.; Pfitzner, L.	Konferenzbeitrag Conference Paper
2012	Optical thin film metrology for optoelectronics Petrik, P.	Zeitschriftenaufsatz Journal Article
2011	Using DES for RoI calculations within semiconductor manufacturing Merhof, Jochen; Lebrecht, Holger; Michl, Markus; Koitzsch, Matthias; Franke, Jörg	Vortrag Presentation
2011	An X-ray photoelectron spectroscopy study of ultra-thin oxynitride films Ladas, S.; Sygellou, L.; Kennou, S.; Wolf, M.; Roeder, G.; Nutsch, A.; Rambach, M.; Lerch, W.	Zeitschriftenaufsatz Journal Article
2011	Innovations in structured thin film design and fabrication for optical applications Qi, H.; Wang, J.; Erdmann, A.; Jin, Y.; Shao, J.; Fan, Z.	Konferenzbeitrag Conference Paper
2011	Current voltage characteristics through grains and grain boundaries of high-k dielectric thin films measured by tunneling atomic force microscopy Murakami, K.; Rommel, Mathias; Yanev, V.; Bauer, A.J.; Frey, L.	Poster
2011	Electrical and structural properties of ultrathin SiON films on Si prepared by plasma nitridation Hourdakis, E.; Nassiopoulou, A.G.; Parisini, A.; Reading, M.A.; Berg, J.A. van den; Sygellou, L.; Ladas, S.; Petrik, P.; Nutsch, A.; Wolf, M.; Roeder, G.	Zeitschriftenaufsatz Journal Article
2011	Amorphous silicon carbide thin films (a-SiC:H) deposited by plasma-enhanced chemical vapor deposition as protective coatings for harsh environment applications Daves, W.; Krauss, A.; Behnel, N.; Haublein, V.; Bauer, A.; Frey, L.	Zeitschriftenaufsatz Journal Article
2011	Current voltage characteristics through grains and grain boundaries of high-k dielectric thin films measured by tunneling atomic force microscopy Murakami, Katsuhisa; Rommel, Mathias; Yanev, Vasil; Bauer, A.J.; Frey, Lothar	Konferenzbeitrag Conference Paper
2011	Characterization of thickness variations of thin dielectric layers at the nanoscale using scanning capacitance microscopy Yanev, V.; Rommel, M.; Bauer, A.J.; Frey, L.	Zeitschriftenaufsatz Journal Article
2011	Conduction mechanisms and environmental sensitivity of solution-processed silicon nanoparticle layers for thin-film transistors Weis, S.; Körmer, R.; Jank, M.P.M.; Lemberger, M.; Otto, M.; Ryssel, H.; Peukert, W.; Frey, L.	Zeitschriftenaufsatz Journal Article
2010	Evaluation of NbN thin films grown by MOCVD and plasma-enhanced ALD for gate electrode application in high-k/SiO2 gate stacks Hinz, J.; Bauer, A.J.; Thiede, T.; Fischer, R.A.; Frey, L.	Zeitschriftenaufsatz Journal Article
2010	Simulation of optical waves in thin-film solar cells Pflaum, C.; Rahimi, Z.; Jandl, C.	Konferenzbeitrag Conference Paper
2010	Impact of temperature increments on tunneling barrier height and effective electron mass for plasma nitrided thin SiO2 layer on a large wafer area Aygun, G.; Roeder, G.; Erlbacher, T.; Wolf, M.; Schellenberger, M.; Pfitzner, L.	Zeitschriftenaufsatz Journal Article
2010	Analysis of NbN thin film deposition by plasma-enhanced ALD for gate electrode application Hinz, J.; Bauer, A.J.; Frey, L.	Zeitschriftenaufsatz Journal Article
2010	Guided phase separation of polymer blend thin films on ion beam-induced pre-patterned substrates Karade, Y.; Madani-Grasset, F.; Berger, R.; Csiba, V.; Rommel, M.; Dietzel, A.	Zeitschriftenaufsatz Journal Article
2010	Characterization of thickness variations of thin dielectric layers at a nanoscale using Scanning Capacitance Microscopy Yanev, V.; Rommel, Mathias; Bauer, A.J.; Frey, L.	Poster
2009	Extraordinary low transmission effects for ultra-thin patterned metal films Reibold, D.; Shao, F.; Erdmann, A.; Peschel, U.	Zeitschriftenaufsatz Journal Article
2009	Deposition of niobium nitride thin films from Tert-Butylamido-Tris-(Diethylamido)-Niobium by a modified industrial MOCVD reactor Thiede, T.B.; Parala, H.; Reuter, K.; Passing, G.; Kirchmeyer, S.; Hinz, J.; Lemberger, M.; Bauer, A.J.; Barreca, D.; Gasparotto, A.; Fischer, R.A.	Zeitschriftenaufsatz Journal Article
2009	Influence of N2 and NH3 annealing on the nitrogen incorporation and k-value of thin ZrO2 layers Weinreich, W.; Ignatova, V.A.; Wilde, L.; Teichert, S.; Lemberger, M.; Bauer, A.J.; Reiche, R.; Erben, E.; Heitmann, J.; Oberbeck, L.; Schröder, U.	Zeitschriftenaufsatz Journal Article
2009	Properties of TaN thin films produced using PVD linear dynamic deposition technique Kozlowska, M.; Oechsner, R.; Pfeffer, M.; Bauer, A.J.; Meissner, E.; Pfitzner, L.; Ryssel, H.; Maass, W.; Langer, J.; Ocker, B.; Schmidbauer, S.; Gonchond, J.-P.	Zeitschriftenaufsatz Journal Article
2009	Correlation of microscopic and macroscopic electrical characteristics of high-k ZrSixO2-x thin films using tunneling atomic force microscopy Weinreich, W.; Wilde, L.; Kücher, P.; Lemberger, M.; Yanev, V.; Rommel, M.; Bauer, A.J.; Erben, E.; Heitmann, J.; Schröder, U.; Oberbeck, L.	Konferenzbeitrag Conference Paper
2009	Complementary metrology within a European joint laboratory Nutsch, A.; Beckhoff, B.; Altmann, R.; Berg, J.A. van den; Giubertoni, D.; Hoenicke, P.; Bersani, M.; Leibold, A.; Meirer, F.; Müller, M.; Pepponi, G.; Otto, M.; Petrik, P.; Reading, M.; Pfitzner, L.; Ryssel, H.	Konferenzbeitrag Conference Paper
2008	Effects of X-ray radiation on the surface chemical composition of plasma deposited thin fluorocarbon films Himmerlich, M.; Yanev, V.; Opitz, A.; Keppler, A.; Schäfer, J.A.; Krischok, S.	Zeitschriftenaufsatz Journal Article
2008	Tunneling atomic-force microscopy as a highly sensitive mapping tool for the characterization of film morphology in thin high-k dielectrics Yanev, V.; Rommel, M.; Lemberger, M.; Petersen, S.; Amon, B.; Erlbacher, T.; Bauer, A.J.; Ryssel, H.; Paskalev, A.; Weinreich, W.; Fachmann, C.; Heitmann, J.; Schroeder, U.	Zeitschriftenaufsatz Journal Article
2008	Characterization of Ru and RuO2 thin films prepared by pulsed metal organic chemical vapor deposition Roeder, G.; Manke, C.; Baumann, P.K.; Petersen, S.; Yanev, V.; Gschwandtner, A.; Ruhl, G.; Petrik, P.; Schellenberger, M.; Pfitzner, L.; Ryssel, H.	Konferenzbeitrag Conference Paper
2007	Polarity asymmetry of stress and charge trapping behavior of thin Hf- and Zr-silicate layers Paskaleva, A.; Lemberger, M.; Bauer, A.J.	Zeitschriftenaufsatz Journal Article
2007	Thermal stability of thin ALD ZrO2 layers as dielectrics in deep trench DRAM devices annealed in N2 and NH3 Weinreich, W.; Lemberger, M.; Erben, E.; Heitmann, J.; Wilde, L.; Ignatova, V.A.; Teichert, S.; Schröder, U.; Oberbeck, L.; Bauer, A.J.; Ryssel, H.; Kücher, P.	Poster
2007	Stress induced leakage current mechanism in thin Hf-silicate layers Paskaleva, A.; Lemberger, M.; Bauer, A.J.	Zeitschriftenaufsatz Journal Article
2007	Verification of grain boundaries in annealed thin ZrO2 films by electrical AFM technique Yanev, V.; Paskaleva, A.; Weinreich, W.; Lemberger, M.; Petersen, S.; Rommel, Mathias; Bauer, A.J.; Ryssel, H.	Poster
2007	MOCVD of tantalum nitride thin films from TBTEMT single source precursor as metal electrodes in CMOS applications Lemberger, M.; Thiemann, S.; Baunemann, A.; Parala, H.; Fischer, R.A.; Hinz, J.; Bauer, A.J.; Ryssel, H.	Konferenzbeitrag Conference Paper
2006	Stress induced leakage currents and charge trapping in thin Zr- and Hf-silicate layers Paskaleva, A.; Lemberger, M.; Bauer, A.J.	Konferenzbeitrag Conference Paper
2006	Correlation between defects, leakage currents and conduction mechanisms in thin high-k dielectric layers Paskaleva, A.; Atanassova, E.; Lemberger, M.; Bauer, A.J.	Konferenzbeitrag Conference Paper
2006	Optical and X-ray characterization of ferroelectric strontium-bismuth-tantalate (SBT) thin films Fried, M.; Petrik, P.; Horvath, Z.E.; Lohner, T.; Schmidt, C.; Schneider, C.; Ryssel, H.	Konferenzbeitrag Conference Paper
2005	MOCVD of cunductive cubic HfN thin films from Hf(NR2)4 and N,N-dimethylhydrazine Kim, Y.; Parala, H.; Bauer, A.J.; Lemberger, M.; Baunemann, A.; Fischer, R.A.	Konferenzbeitrag Conference Paper
2005	An asymmetry of conduction mechanisms and charge trapping in thin high-k Hf(x)Ti(y)Si(z)O films Paskaleva, A.; Bauer, A.J.; Lemberger, M.	Zeitschriftenaufsatz Journal Article
2005	Conduction mechanisms and an evidence for phonon-assisted conduction process in thin high-k Hf(x)Ti(y)Si(z)O films Paskaleva, A.; Bauer, A.; Lemberger, M.	Zeitschriftenaufsatz Journal Article
2005	Thin Hf(x)Ti(y)Si(z)O films with varying Hf to Ti contents as candidates for high-k dielectrics Bauer, A.J.; Paskaleva, A.; Lemberger, M.; Frey, L.; Ryssel, H.	Konferenzbeitrag Conference Paper
2005	MOCVD of conductive cubic HfN thin films from Hf(NR2)4 and N,N-dimethylhydrazine Kim, Y.; Parala, H.; Bauer, A.J.; Lemberger, M.; Baunemann, A.; Fischer, R.A.	Konferenzbeitrag Conference Paper
2004	Different current conduction mechanisms through thin high-k Hf(x)Ti(y)Si(z)O films due to the varying Hf to Ti ratio Paskaleva, A.; Bauer, A.J.; Lemberger, M.; Zurcher, S.	Zeitschriftenaufsatz Journal Article
2004	Optical characterization of ferroelectric Strontium-Bismuth-Tantalate (SBT) thin films Schmidt, C.; Petrik, P.; Schneider, C.; Fried, M.; Lohner, T.; Barsony, I.; Gyulai, J.; Ryssel, H.	Konferenzbeitrag Conference Paper
2003	Investigation of implantation-induced defects in thin gate oxides using low field tunnel currents Jank, M.; Frey, L.; Bauer, A.J.; Ryssel, H.	Konferenzbeitrag Conference Paper
2001	Suppression of boron penetration through thin gate oxides by nitrogen implantation into the gate electrode in PMOS devices Strobel, S.; Bauer, A.J.; Beichele, M.; Ryssel, H.	Zeitschriftenaufsatz Journal Article
2001	Electrical reliability aspects of through the gate implanted MOS-structures with thin oxides Jank, M.; Lemberger, M.; Bauer, A.J.; Frey, L.; Ryssel, H.	Zeitschriftenaufsatz Journal Article
2001	Reliability of ultra-thin N2O-nitrided oxides grown by RTP under low-pressure in different gas atmospheres Beichele, M.; Bauer, A.J.; Herden, M.; Ryssel, H.	Zeitschriftenaufsatz Journal Article
2001	Suppression of boron penetration through thin gate oxides by nitrogen implantation into the gate electrode Herden, M.; Bauer, A.J.; Beichele, M.; Ryssel, H.	Zeitschriftenaufsatz Journal Article
2001	Reliability of ultrathin nitrided oxides grown in low- pressure N2O ambient Beichele, M.; Bauer, A.J.; Ryssel, H.	Zeitschriftenaufsatz Journal Article
2000	Charge state dependence of stopping power for light ions penetrating thin carbon foils at low velocity Mu, Y.; Burenkov, A.; Ryssel, H.; Xia, Y.; Mei, L.	Zeitschriftenaufsatz Journal Article
2000	Reliability of ultra-thin N2O-nitrided oxides grown by RTP under low pressure and in different gas atmospheres Beichele, M.; Bauer, A.J.; Ryssel, H.	Zeitschriftenaufsatz Journal Article
2000	Suppression of boron penetration through thin gate oxides by nitrogen implantation into the gate electrode of PMOS devices Herden, M.; Bauer, A.J.; Ryssel, H.	Zeitschriftenaufsatz Journal Article
2000	Gate oxide damage due to through the gate implantation in MOS-structures with ultrathin and standard oxides Jank, M.P.M.; Lemberger, M.; Frey, L.; Ryssel, H.	Konferenzbeitrag Conference Paper
2000	Charge-state dependence of stopping power for light ions penetrating thin carbon foils at low velocity Mu, Y.G.; Burenkov, A.; Ryssel, H.; Xia, Y.Y.; Mei, L.M.	Zeitschriftenaufsatz Journal Article
1999	Nondestructive analytical tools for characterization of thin titanium silicide films prepared by conventional and direct step silicidation with enhanced transition Kal, S.; Ryssel, H.	Zeitschriftenaufsatz Journal Article
1999	Reliability of ultra-thin gate oxides grown in low-pressure N20 ambient or on nitrogen-implanted silicon Bauer, A.J.; Beichele; Herden, M.; Ryssel, H.	Zeitschriftenaufsatz Journal Article
1999	Thin stoichiometric silicon nitride prepared by r.f. reactive sputtering Qian, F.; Temmel, G.; Schnupp, R.; Ryssel, H.	Zeitschriftenaufsatz Journal Article
1999	Nondestructive analytical tools for characterization of thin titanium silicide films prepared by conventional and direct step silicidation with enhanced transition Kal, S.; Ryssel, H.	Zeitschriftenaufsatz Journal Article
1999	MOCVD of ferroelectric thin films Schmidt, C.; Lehnert, W.; Leistner, T.; Frey, L.; Ryssel, H.	Zeitschriftenaufsatz Journal Article
1998	Noncontacting measurement of thickness of thin titanium silicide films using spectroscopic ellipsometry Kal, S.; Kasko, I.; Ryssel, H.	Zeitschriftenaufsatz Journal Article
1998	Thin carbon films as elctrodes for bioelectronic applications Schnupp, R.; Kühnhold, R.; Temmel, G.; Burte, E.; Ryssel, H.	Zeitschriftenaufsatz Journal Article
1997	Characterization of ultrathin on stacked layers consisting of thermally grown bottom oxide and deposited silicon nitride Bauer, A.J.; Burte, E.P.; Ryssel, H.	Zeitschriftenaufsatz Journal Article
1997	MOCVD of ferroelectric thin films Schmidt, C.; Burte, E.P.	Konferenzbeitrag Conference Paper
1997	Characterization of thin TiSi2 films by spectroscopic ellipsometry and thermal wave analysis Kasko, I.; Kal, S.; Ryssel, H.	Zeitschriftenaufsatz Journal Article
1996	Characterization of ultrathin on stacked layers consisting of thermally grown bottom oxide and deposited silicon nitride Bauer, A.J.; Burte, E.P.; Ryssel, H.	Zeitschriftenaufsatz Journal Article
1995	Preparation and characterization of ultra-thin cobalt silicide for VLSI applications Kal, S.; Kasko, I.; Ryssel, H.	Zeitschriftenaufsatz Journal Article
1995	Structural and electrical properties of thin SiO2 layers grown by RTP in a mixture of N2O and O2 Bauer, A.J.; Burte, E.P.	Zeitschriftenaufsatz Journal Article
1995	Low pressure chemical vapour depostition of tantalum pentoxide thin layers Burte, E.P.; Rausch, N.	Zeitschriftenaufsatz Journal Article
1995	Ion-beam mixed ultra-thin cobalt silicide (CoSi2) films by cobalt sputtering and rapid thermal annealing Kal, S.; Kasko, I.; Ryssel, H.	Zeitschriftenaufsatz Journal Article

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