Fraunhofer Institute for Integrated Systems and Device Technology IISBCelebrating the Successful Completion of the 21st Fraunhofer IISB Lithography Simulation Workshop
The Computational Lithography and Optics Group is delighted to celebrate the successful conclusion of the 21st Fraunhofer IISB Lithography Simulation Workshop, held in Behringersmühle from May 28 to 30, 2026.
Over three inspiring days, the workshop brought together around 50 participants from academia and industry, creating a vibrant environment for scientific exchange, collaboration, and networking in the heart of Franconian Switzerland.
This year’s workshop featured exciting discussions and presentations covering a broad range of topics in advanced lithography and computational modeling, including:
- Present and future challenges in EUV lithography
- AI- and GPU-accelerated computational lithography
- Computational lithography for photonics and advanced manufacturing
- Metrology modeling and process characterization
We were honored to host outstanding invited speakers and researchers who shared recent developments, innovative methodologies, and forward-looking perspectives in computational optics, semiconductor lithography, photochemistry, metrology, and applied artificial intelligence.
A special highlight of the workshop was the strong participation of PhD students and early-career researchers, whose presentations and discussions contributed greatly to the collaborative and inspiring atmosphere of the event.
Beyond the technical sessions, the workshop provided valuable opportunities for networking, exchanging ideas, and strengthening collaborations within the lithography simulation community.
We sincerely thank all speakers, participants, organizers, and supporters who contributed to making the 21st workshop such a successful and memorable event. We look forward to continuing these discussions and welcoming the community again at future workshops.