Erlangen, Germany / San José, USA | Dr. Andreas Erdmann, head of the Computational Lithography and Optics group at Fraunhofer IISB for decades and SPIE (International Society for Optics and Photonics) Fellow since 2016, has been honored with the 2026 SPIE Frits Zernike Award for Microlithography. The award ceremony took place on February 23, 2026, at the SPIE Advanced Lithography + Patterning conference in San José, California. Erdmann's achievements in deep ultraviolet (DUV) and extreme ultraviolet (EUV) lithography were particularly highlighted at the event. The award is considered the highest honor in microlithography.
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