Wettenberg/Erlangen | The Fraunhofer Institute for Integrated Systems and Device Technology IISB and PVA TePla AG are pooling their expertise in a joint lab for the production of aluminum nitride (AlN) crystals. As a European first, this partnership enables industrially supported smallbatch production of monocrystalline AlN substrates with a diameter of two inches for research and development purposes. This significantly improves the availability of AlN substrates in Europe, which in turn accelerates the development of AlN-based devices and systems and their transition to industrial applications.
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Fraunhofer Institute for Integrated Systems and Device Technology IISB