Equipment Simulation

We support the development of high-temperature equipment and processes by our expertise in numerical modeling of heat and mass transport phenomena. Specific expertise is available for crystal growth and epitaxial processes.

We are also experienced with other thermal processes like e.g. wafer annealing.

We provide solutions for furnace modifications in order to optimize the equipment and we give new insights into the processes, especially for parameters that are hardly accessible via measuring techniques like species distributions or convection pattern.


© Fraunhofer IISB
Global simulation of a Czochralski puller
© Fraunhofer IISB
3D CFD model of a CVD process
© Fraunhofer IISB
Stress distribution in a semiconductor crystal


  • Thermal simulations (conduction, convection, radiation)
  • Flow simulations (gas, melt, turbulence including magnetohydrodynamics)
  • Stress simulations
  • Electromagnetic field simulations
  • Simulation of species transport including chemical reactions
  • Software tools: CrysMAS, OpenFOAM, Ansys
  • Processes: Cz, VGF, DS, FZ, EFG, LPE, THM, CVD, PVT, HVPE, Annealing
  • Materials:Si, Ge, GaAs, InP, GaN, AlN, SiC, CdZnTe, Halides, Oxides

Focus Areas

Explore the areas of semiconductor crystal growth, epitaxy, and device processing including characterization and modeling.